发明申请
- 专利标题: GATE CONTROLLED FLOATING WELL VERTICAL MOSFET
- 专利标题(中): 门控浮动井垂直MOSFET
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申请号: US10708381申请日: 2004-02-27
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公开(公告)号: US20050190590A1公开(公告)日: 2005-09-01
- 发明人: Xiangdong Chen , Dureseti Chidambarrao , Geng Wang
- 申请人: Xiangdong Chen , Dureseti Chidambarrao , Geng Wang
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: G11C11/24
- IPC分类号: G11C11/24 ; H01L21/8242 ; H01L27/02 ; H01L27/108
摘要:
A novel transistor structure for a DRAM cell includes two deep trenches, one trench including a vertical storage cell for storing the data and the second trench including a vertical control cell for controlling the p-well voltage, which, in effect, places part of the p-well in a floating condition thus decreasing the threshold voltage as compared to when the vertical pass transistor is in an off-state. This enables the transistor to exhibit increased gate overdrive and drive current during an active wordline voltage commonly applied to both gates of the storage and control cells.
公开/授权文献
- US07102914B2 Gate controlled floating well vertical MOSFET 公开/授权日:2006-09-05
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