发明申请
US20050191434A1 Nanolithography methods and products therefor and produced thereby 有权
纳米光刻方法和产品,由此生产

Nanolithography methods and products therefor and produced thereby
摘要:
In one aspect, a method of nanolithography is provided using a driving force to control the movement of a deposition compound from a scanning probe microscope tip to a substrate. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.
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