发明申请
- 专利标题： METHODS AND APPARATUS FOR DEFECT ISOLATION
- 专利标题（中）： 缺陷分离方法与装置
-
申请号： US10708380申请日： 2004-02-27
-
公开(公告)号： US20050193297A1公开(公告)日： 2005-09-01
- 发明人: Leendert Huisman , William Huott , Maroun Kassab , Franco Motika
- 申请人： Leendert Huisman , William Huott , Maroun Kassab , Franco Motika
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G01R31/28
- IPC分类号： G01R31/28 ; G01R31/3185
摘要：
In a first aspect, a first method is provided for isolating a defect in a scan chain. The first method includes the steps of (1) modifying a first test mode of one or more of a plurality of latches included in the scan chain; (2) operating the one or more latches whose first test modes are modified in the modified first test mode; and (3) operating one or more of the plurality of latches included in the scan chain in a second test mode. Numerous other aspects are provided.
公开/授权文献
信息查询
