发明申请
US20050196534A1 CVD method using metal carbonyl gas and computer storage medium storing program for controlling same 有权
使用金属羰基气体的CVD法和计算机存储介质存储程序进行控制

CVD method using metal carbonyl gas and computer storage medium storing program for controlling same
摘要:
A CVD method for forming a metal film on a substrate by using a metal carbonyl gas includes a preparing step for setting a vacuum chamber at a vacuum pressure and heating the substrate in the vacuum chamber to a first temperature where the metal carbonyl gas is decomposed. Also included are a supplying step for supplying the metal carbonyl gas into the vacuum chamber while exhausting the vacuum chamber with a first vacuum pumping speed and a removing step for removing a decomposed gas of the metal carbonyl gas by stopping supplying of the metal carbonyl gas and quickly exhausting the vacuum chamber with a second vacuum pumping speed sufficiently higher than the first vacuum pumping speed. The supplying step and the removing step can be repeatedly as desired.
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