发明申请
US20050199913A1 Word and bit line arrangement for a FinFET semiconductor memory
审中-公开
用于FinFET半导体存储器的字和位线布置
- 专利标题: Word and bit line arrangement for a FinFET semiconductor memory
- 专利标题(中): 用于FinFET半导体存储器的字和位线布置
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申请号: US11074345申请日: 2005-03-07
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公开(公告)号: US20050199913A1公开(公告)日: 2005-09-15
- 发明人: Franz Hofmann , Thomas Schulz , Michael Specht
- 申请人: Franz Hofmann , Thomas Schulz , Michael Specht
- 优先权: DEDE10241171.9 20020905
- 主分类号: H01L21/8247
- IPC分类号: H01L21/8247 ; H01L21/336 ; H01L21/8246 ; H01L27/105 ; H01L27/115 ; H01L29/788 ; H01L29/792
摘要:
The invention relates to a semiconductor memory having a multiplicity of fins made of semiconductor material which are spaced apart from one another, a multiplicity of channel regions and contact regions being formed in each of the fins, a multiplicity of word lines, a multiplicity of storage layers, at least one of the storage layers being arranged between each of the channel regions and the word line, and a multiplicity of bit lines, the longitudinal axes of first bit line portions running parallel to a first bit line direction and the longitudinal axes of second bit line portions running parallel to a second bit line direction, the second bit line direction being rotated relative to the first bit line direction, each of the bit lines being electrically connected to a multiplicity of the contact regions, wherein, between two contact regions of the same fin that are connected to one of the bit lines, a contact region is not connected to the respective bit line.
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