发明申请
US20050201514A1 Reflective X-ray microscope and inspection system for examining objects with wavelengths < 100 nm
有权
用于检查波长小于100nm的物体的反射X射线显微镜和检查系统
- 专利标题： Reflective X-ray microscope and inspection system for examining objects with wavelengths < 100 nm
- 专利标题（中）： 用于检查波长小于100nm的物体的反射X射线显微镜和检查系统
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申请号： US10983362申请日： 2004-11-08
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公开(公告)号： US20050201514A1公开(公告)日： 2005-09-15
- 发明人: Hans-Jurgen Mann , Udo Dinger , Wilhelm Ulrich , Wolfgang Reinecke , Thomas Engel , Axel Zibold , Wolfgang Harnisch , Marco Wedowski , Dieter Pauschinger
- 申请人： Hans-Jurgen Mann , Udo Dinger , Wilhelm Ulrich , Wolfgang Reinecke , Thomas Engel , Axel Zibold , Wolfgang Harnisch , Marco Wedowski , Dieter Pauschinger
- 优先权： DE10220816.6 20020510; DE10220815.8 20020510
- 主分类号： G03F1/16
- IPC分类号： G03F1/16 ; G21K1/06 ; G21K7/00 ; H01L21/027
摘要：
There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength
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