发明申请
- 专利标题: Mixing box, and apparatus and method for producing films
- 专利标题(中): 混合箱,以及制造薄膜的装置和方法
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申请号: US11132173申请日: 2005-05-19
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公开(公告)号: US20050211168A1公开(公告)日: 2005-09-29
- 发明人: Takakazu Yamada , Takeshi Masuda , Masahiko Kajinuma , Masaki Uematsu , Koukou Suu
- 申请人: Takakazu Yamada , Takeshi Masuda , Masahiko Kajinuma , Masaki Uematsu , Koukou Suu
- 专利权人: Ulvac Inc.
- 当前专利权人: Ulvac Inc.
- 优先权: JP369279/2001 20011203; JP012566/2002 20020122
- 主分类号: B01F3/02
- IPC分类号: B01F3/02 ; B01F5/02 ; B01J4/00 ; B01J10/02 ; B01J19/24 ; C23C16/44 ; C23C16/455 ; C23C16/458 ; H01L21/00 ; C23C16/00
摘要:
A thin film manufacturing system, wherein a stage for placing a substrate thereon is disposed within a vacuum reactor and a gas head for supplying a film forming gas to a central area on a top face of the vacuum reactor is arranged so that the gas head is opposed to the stage. A cylindrical sleeve member is disposed and comes in close contact with a side wall of the stage to surround a periphery of the stage. The height of the stage can be established at the position where the volume of a second space formed below the stage and connected to a vacuum discharge means is larger than that of a first space formed above the stage, in such a manner that an exhaust gas is isotropically discharged from the first space without causing any convection current therein through the interstice between the sleeve member and an inner wall surface constituting the reactor.
公开/授权文献
- US08118935B2 Mixing box, and apparatus and method for producing films 公开/授权日:2012-02-21
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