发明申请
US20050214445A1 Method and processing system for determining coating status of a ceramic substrate heater
审中-公开
确定陶瓷基板加热器涂层状态的方法和处理系统
- 专利标题： Method and processing system for determining coating status of a ceramic substrate heater
- 专利标题（中）： 确定陶瓷基板加热器涂层状态的方法和处理系统
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申请号： US10811574申请日： 2004-03-29
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公开(公告)号： US20050214445A1公开(公告)日： 2005-09-29
- 发明人: Cory Wajda , David O'Meara
- 申请人： Cory Wajda , David O'Meara
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 主分类号： B05C11/00
- IPC分类号： B05C11/00 ; B05D1/00 ; C23C16/00 ; C23C16/52 ; H01C17/065 ; H01C17/075 ; H01L21/00
摘要：
A method and system for monitoring coating status of a ceramic substrate heater in a process chamber. The method includes heating a ceramic substrate heater to a desired temperature, exposing the ceramic substrate heater to a reactant gas during a process, and monitoring optical emission from the heated ceramic substrate heater to determine coating status of the ceramic substrate heater. Processes that can be monitored include a chamber cleaning process and a chamber conditioning process.