发明申请
- 专利标题: Low-resistance n type semiconductor diamond and process for producing the same
- 专利标题(中): 低电阻n型半导体金刚石及其制造方法
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申请号: US10506493申请日: 2003-12-22
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公开(公告)号: US20050217561A1公开(公告)日: 2005-10-06
- 发明人: Akihiko Namba , Takahiro Imai , Hisao Takeuchi
- 申请人: Akihiko Namba , Takahiro Imai , Hisao Takeuchi
- 优先权: JP2002-379229 20021227
- 国际申请: PCT/JP03/16492 WO 20031222
- 主分类号: C30B29/04
- IPC分类号: C30B29/04 ; C23C16/27 ; C23C16/448 ; C23C16/48 ; C30B25/10 ; H01L21/205 ; H01L21/22 ; C30B7/00 ; C30B21/02 ; C30B28/06
摘要:
Concerns lithium-doped diamond: Low-resistivity n-type semiconductor diamond doped with lithium and nitrogen, and a method of manufacturing such diamond are provided. Low-resistivity n-type semiconductor diamond containing 1017 cm−3 or more of lithium atoms and nitrogen atoms together, in which are respectively doped lithium atoms into carbon-atom interstitial lattice sites, and nitrogen atoms into carbon-atom substitutional sites, with the lithium and the nitrogen holding arrangements that neighbor each other. To obtain low-resistivity n-type semiconductor diamond, in a method for the vapor synthesis of diamond, photodissociating source materials by photoexcitation utilizing vacuum ultraviolet light and irradiating a lithium source material with an excimer laser to scatter and supply lithium atoms enables the diamond to be produced.
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