发明申请
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
-
申请号： US10816189申请日： 2004-04-02
-
公开(公告)号： US20050219481A1公开(公告)日： 2005-10-06
- 发明人: Henrikus Herman Cox , Petrus Marinus Christianus Van Den Biggelaar , Frits Meulen , Franciscus Andreas Cornelis Spanjers , Jan-Gerard Van Der Toorn , Arend-Jan Migchelbrink
- 申请人： Henrikus Herman Cox , Petrus Marinus Christianus Van Den Biggelaar , Frits Meulen , Franciscus Andreas Cornelis Spanjers , Jan-Gerard Van Der Toorn , Arend-Jan Migchelbrink
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027
摘要：
A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the projection system and the substrate.
公开/授权文献
- US07295283B2 Lithographic apparatus and device manufacturing method 公开/授权日：2007-11-13
信息查询
IPC分类:
