公开(公告)号：US20050219481A1

公开(公告)日：2005-10-06

申请号：US10816189

申请日：2004-04-02

申请人： Henrikus Herman Cox ,  Petrus Marinus Christianus Van Den Biggelaar ,  Frits Meulen ,  Franciscus Andreas Cornelis Spanjers ,  Jan-Gerard Van Der Toorn ,  Arend-Jan Migchelbrink

发明人： Henrikus Herman Cox ,  Petrus Marinus Christianus Van Den Biggelaar ,  Frits Meulen ,  Franciscus Andreas Cornelis Spanjers ,  Jan-Gerard Van Der Toorn ,  Arend-Jan Migchelbrink

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70341

摘要： A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the projection system and the substrate.

摘要翻译： 描述了一种用于浸没式光刻的光刻设备，其中补偿控制器控制致动器以将力施加到基板上，其尺寸相等，方向与施加到基板的力相反，该液体供应系统在投影系统和 基质。

公开(公告)号：US20060290908A1

公开(公告)日：2006-12-28

申请号：US11167563

申请日：2005-06-28

申请人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

公开(公告)号：US20050224687A1

公开(公告)日：2005-10-13

申请号：US10822139

申请日：2004-04-12

申请人： Marcel Heertjes ,  Jan-Gerard Van Der Toorn

发明人： Marcel Heertjes ,  Jan-Gerard Van Der Toorn

IPC分类号： F16F15/02 ,  F16M13/00 ,  G05D19/02 ,  H01L21/027

CPC分类号： F16F15/02 ,  G03F7/709

摘要： A vibration isolation system isolates a body from its surroundings with respect to vibrations. The vibration isolation system includes active isolator devices that isolate and damp the body in unstable directions. However, such active isolators may exert damping forces not only in the unstable direction, but simultaneously in other stable directions due to mechanical coupling of the stable and unstable directions. As a result the damping and isolation in the other stable directions may be deteriorated due to the active isolation and damping. Employing modal decoupling, i.e. decomposing any vibration into independent directions, and isolating and damping in the independent directions, enables compensation of any vibration in an unstable direction without influencing the isolation and damping performance in any other, possibly stable, direction.

摘要翻译： 振动隔离系统将身体与其周围环境相隔离。 隔振系统包括主动隔离装置，可在不稳定的方向隔离和潮湿身体。 然而，这种有源隔离器不仅可以在不稳定的方向施加阻尼力，而且可以由于稳定和不稳定方向的机械耦合而在其它稳定的方向上施加阻尼力。 结果，由于主动隔离和阻尼，其它稳定方向的阻尼和隔离可能会恶化。 采用模态去耦，即将任何振动分解为独立的方向，以及在独立方向上进行隔离和阻尼，可以补偿不稳定方向上的任何振动，而不会影响任何其他可能稳定的方向的隔离和阻尼性能。

公开(公告)号：US20060250601A1

公开(公告)日：2006-11-09

申请号：US11120186

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/58

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US20060215131A1

公开(公告)日：2006-09-28

申请号：US11090699

申请日：2005-03-28

申请人： Jan-Gerard Van Der Toorn ,  Hans Butler ,  Henrikus Cox ,  Evert Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Frencken ,  Martijn Houkes ,  Antonius Arends ,  Minne Cuperus

发明人： Jan-Gerard Van Der Toorn ,  Hans Butler ,  Henrikus Cox ,  Evert Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Frencken ,  Martijn Houkes ,  Antonius Arends ,  Minne Cuperus

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

摘要翻译： 光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括一个流体供应系统，用于在基板和投影系统的最终透镜元件之间提供流体，以及位置控制器，用于控制流体供应系统的位置。 位置控制器被配置为具有基板的位置量，通过向基板的位置量添加位置偏移来确定液体供应系统的期望位置，并且根据期望位置定位液体供应系统 。 位置量可以包括衬底台的位置和/或旋转位置和/或衬底高度的高度函数。

公开(公告)号：US20060126040A1

公开(公告)日：2006-06-15

申请号：US11009549

申请日：2004-12-13

申请人： Hans Butler ,  Frank Auer ,  Martinus Duijnhoven ,  Pieter Gertrudis Meijers ,  Jan-Gerard Van Der Toorn ,  Joost De Pee

发明人： Hans Butler ,  Frank Auer ,  Martinus Duijnhoven ,  Pieter Gertrudis Meijers ,  Jan-Gerard Van Der Toorn ,  Joost De Pee

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  F16F9/003 ,  F16F9/3235 ,  F16F15/0232 ,  F16F15/0275 ,  G03F7/70833

摘要： To correctly transfer a pattern to a substrate, or transfer any other pattern having small features, a transfer of vibrations from an external support structure, e.g. a floor, is minimized by using a vibration isolation support device, e.g. an airmount. To improve the vibration isolation characteristics of the airmount, the (positive) stiffness of the airmount is lowered by providing a pressure reducer that is configured to reduce a gas pressure change in a gas chamber of the airmount, which pressure change is a result of a volume change of the gas chamber. Due to vibrations the volume of said gas chamber changes. Due to the stiffness reduction device, the corresponding pressure change, and thus a force exerted on the supported object, is reduced, thereby reducing the stiffness of the airmount.

摘要翻译： 为了正确地将图案转移到基板，或传送具有小特征的任何其它图案，从外部支撑结构传递振动，例如， 通过使用振动隔离支撑装置，例如，将地板最小化。 一个空中装甲 为了提高空中装置的隔振特性，通过提供减压器来降低空中装置的（正）刚度，该减压器被构造成减少气垫的气室中的气体压力变化，该压力变化是由于 气室的体积变化。 由于振动，所述气室的体积变化。 由于刚度降低装置，相应的压力变化以及因此施加在被支撑物体上的力被减小，从而降低了空中装置的刚度。

公开(公告)号：US20060038968A1

公开(公告)日：2006-02-23

申请号：US10921348

申请日：2004-08-19

申请人： Nicolaas Kemper ,  Henrikus Marie Cox ,  Sjoerd Nicolaas Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Kate ,  Jeroen Johannes Sophia Mertens ,  Frits Der Meulen ,  Franciscus Herman Maria Teunissen ,  Jan-Gerard Van Der Toorn ,  Martinus Cornelis Verhagen ,  Stefan Belfroid ,  Johannes Smeulers

发明人： Nicolaas Kemper ,  Henrikus Marie Cox ,  Sjoerd Nicolaas Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Kate ,  Jeroen Johannes Sophia Mertens ,  Frits Der Meulen ,  Franciscus Herman Maria Teunissen ,  Jan-Gerard Van Der Toorn ,  Martinus Cornelis Verhagen ,  Stefan Belfroid ,  Johannes Smeulers

IPC分类号： G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20070114451A1

公开(公告)日：2007-05-24

申请号：US11603228

申请日：2006-11-22

申请人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

发明人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

IPC分类号： G21G5/00

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20060126037A1

公开(公告)日：2006-06-15

申请号：US11012061

申请日：2004-12-15

申请人： Hans Jansen ,  Patricius Tinnemans ,  Jan-Gerard Van Der Toorn

发明人： Hans Jansen ,  Patricius Tinnemans ,  Jan-Gerard Van Der Toorn

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.

摘要翻译： 本发明涉及当封闭表面用于将液体限制在液体供应系统中时，减少光刻设备中浸没液的污染的方法。 为了避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒污染，闭合表面保持离开液体供应系统一定距离，使得闭合表面和液体供应系统之间没有碰撞，但是 液体仍然受到限制。

公开(公告)号：US20060082741A1

公开(公告)日：2006-04-20

申请号：US10966111

申请日：2004-10-18

申请人： Jan-Gerard Van Der Toorn ,  Christiaan Hoogendam

发明人： Jan-Gerard Van Der Toorn ,  Christiaan Hoogendam

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： To facilitate, for example, removal of a substrate between exposures of different substrates, an actuated closing plate is used to replace a substrate, a substrate table, or both, as a part of a boundary of a space in a lithographic apparatus containing liquid without, for example, breaking a seal containing the liquid.

摘要翻译： 为了便于例如在不同基板的曝光之间移除基板，使用致动的封闭板来代替衬底，衬底台或两者，作为包含液体的光刻设备中的空间的边界的一部分，而没有 例如，打破包含液体的密封件。