发明申请
- 专利标题： Sample dimension measuring method and scanning electron microscope
- 专利标题（中）： 样品尺寸测量方法和扫描电子显微镜
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申请号： US10504869申请日： 2003-05-19
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公开(公告)号： US20050247876A1公开(公告)日： 2005-11-10
- 发明人: Hiroki Kawada , Takashi Iizumi , Tadashi Otaka
- 申请人： Hiroki Kawada , Takashi Iizumi , Tadashi Otaka
- 申请人地址： US Washington D.C. 20005-3096
- 专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址： US Washington D.C. 20005-3096
- 优先权： JP2001-259126 20010829
- 国际申请： PCT/JP03/06203 WO 20030519
- 主分类号： G01B15/00
- IPC分类号： G01B15/00 ; G01N23/225 ; H01J3/02 ; H01J9/04 ; H01J37/065 ; H01J37/28
摘要：
An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.