Sample dimension measuring method and scanning electron microscope
    1.
    发明申请
    Sample dimension measuring method and scanning electron microscope 有权
    样品尺寸测量方法和扫描电子显微镜

    公开(公告)号:US20080179517A1

    公开(公告)日:2008-07-31

    申请号:US11902088

    申请日:2007-09-19

    IPC分类号: G01N23/00 G01B5/28

    摘要: An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern.To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

    摘要翻译: 本发明的目的是抑制由于扫描电子束的收缩量不同于图案的事实而引起的测量误差。 为了实现该目的,根据本发明,就样品图案的种类和通过扫描测量的特定图案的尺寸值准备指示电子束照射在样品上时图形尺寸变化过程的功能 特定图案上的电子束被拟合到为特定图案准备的功能,以在特定图案改变之前计算特定图案的尺寸。

    Sample dimension measuring method and scanning electron microscope
    2.
    发明申请
    Sample dimension measuring method and scanning electron microscope 有权
    样品尺寸测量方法和扫描电子显微镜

    公开(公告)号:US20050247876A1

    公开(公告)日:2005-11-10

    申请号:US10504869

    申请日:2003-05-19

    摘要: An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

    摘要翻译: 本发明的目的是抑制由于扫描电子束的收缩量不同于图案的事实而引起的测量误差。 为了实现该目的,根据本发明,就样品图案的种类和通过扫描测量的特定图案的尺寸值准备指示电子束照射在样品上时图形尺寸变化过程的功能 特定图案上的电子束被拟合到为特定图案准备的功能,以在特定图案改变之前计算特定图案的尺寸。

    Sample dimension measuring method and scanning electron microscope
    3.
    发明授权
    Sample dimension measuring method and scanning electron microscope 有权
    样品尺寸测量方法和扫描电子显微镜

    公开(公告)号:US07910886B2

    公开(公告)日:2011-03-22

    申请号:US11902088

    申请日:2007-09-19

    IPC分类号: H01J37/28 G01N23/225

    摘要: An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

    摘要翻译: 本发明的目的是抑制由于扫描电子束的收缩量不同于图案的事实而引起的测量误差。 为了实现该目的,根据本发明,就样品图案的种类和通过扫描测量的特定图案的尺寸值准备指示电子束照射在样品上时图形尺寸变化过程的功能 特定图案上的电子束被拟合到为特定图案准备的功能,以在特定图案改变之前计算特定图案的尺寸。

    Sample dimension measuring method and scanning electron microscope
    4.
    发明授权
    Sample dimension measuring method and scanning electron microscope 有权
    样品尺寸测量方法和扫描电子显微镜

    公开(公告)号:US07285777B2

    公开(公告)日:2007-10-23

    申请号:US10504869

    申请日:2003-05-19

    IPC分类号: H01J37/28 G01N23/225

    摘要: An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern.To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

    摘要翻译: 本发明的目的是抑制由于扫描电子束的收缩量不同于图案的事实而引起的测量误差。 为了实现该目的,根据本发明,就样品图案的种类和通过扫描测量的特定图案的尺寸值准备指示电子束照射在样品上时图形尺寸变化过程的功能 特定图案上的电子束被拟合到为特定图案准备的功能,以在特定图案改变之前计算特定图案的尺寸。

    Method of forming a sample image and charged particle beam apparatus
    5.
    发明授权
    Method of forming a sample image and charged particle beam apparatus 有权
    形成样品图像和带电粒子束装置的方法

    公开(公告)号:US07800059B2

    公开(公告)日:2010-09-21

    申请号:US12073359

    申请日:2008-03-04

    摘要: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译: 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下,能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的,本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法,该方法包括以下步骤:形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像,以及用于实现上述方法的带电粒子束装置。

    Image evaluation method and microscope
    7.
    发明授权
    Image evaluation method and microscope 失效
    图像评估方法和显微镜

    公开(公告)号:US07340111B2

    公开(公告)日:2008-03-04

    申请号:US11124252

    申请日:2005-05-09

    IPC分类号: G06K9/32

    摘要: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

    摘要翻译: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于,在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率,在图像的整个区域或图像的整个区域上进行平均化, 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象,因此可以获得高精度和良好重复性的图像分辨率评估值。

    Method of forming a sample image and charged particle beam apparatus
    8.
    发明申请
    Method of forming a sample image and charged particle beam apparatus 失效
    形成样品图像和带电粒子束装置的方法

    公开(公告)号:US20070029478A1

    公开(公告)日:2007-02-08

    申请号:US11501229

    申请日:2006-08-09

    IPC分类号: G21K7/00

    摘要: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译: 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下,能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的,本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法,该方法包括以下步骤:形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像,以及用于实现上述方法的带电粒子束装置。

    Image evaluation method and microscope
    10.
    发明授权
    Image evaluation method and microscope 失效
    图像评估方法和显微镜

    公开(公告)号:US07805023B2

    公开(公告)日:2010-09-28

    申请号:US11802262

    申请日:2007-05-21

    IPC分类号: G06K9/32 G21K7/00

    摘要: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

    摘要翻译: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于,在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率,在图像的整个区域或图像的整个区域上进行平均化, 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象,因此可以获得高精度和良好重复性的图像分辨率评估值。