公开(公告)号：US12145006B2

公开(公告)日：2024-11-19

申请号：US17970410

申请日：2022-10-20

Applicant: Varian Medical Systems, Inc.

Inventor： Mark Everett Trail ,  James Edward Clayton

IPC: A61N5/10 ,  H01J3/10 ,  H01J35/06 ,  H01J35/14 ,  H01J37/07 ,  H01J37/073 ,  H01J37/075 ,  H05H9/00 ,  H01J3/02 ,  H01J37/147

Abstract: Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}-6 cGy/bunch.

公开(公告)号：US11478664B2

公开(公告)日：2022-10-25

申请号：US16920019

申请日：2020-07-02

Applicant: Varian Medical Systems, Inc.

Inventor： Mark Everett Trail ,  James Edward Clayton

IPC: A61L2/10 ,  A61N5/10 ,  H01J37/073 ,  H01J35/14 ,  H01J35/06 ,  H01J37/075 ,  H05H9/00 ,  H01J3/02 ,  H01J37/147

Abstract: Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}−6cGy/bunch.

公开(公告)号：US11355301B2

公开(公告)日：2022-06-07

申请号：US17292862

申请日：2019-11-07

Applicant: PEKING UNIVERSITY

Inventor： Xianlong Wei ,  Wei Yang

IPC: H01J9/18 ,  H01J3/02

Abstract: Provided are an on-chip miniature electron source and a method for manufacturing the same. The on-chip miniature electron source includes: a thermal conductive layer; an insulating layer provided on the thermal conductive layer, where the insulating layer is made of a resistive-switching material, and at least one through hole is provided in the insulating layer; and at least one electrode pair provided on the insulating layer, where at least one electrode of the electrode pair is in contact with and connected to the thermal conductive layer via the through hole, where there is a gap between two electrodes of the electrode pair, and a tunnel junction is formed within a region of the insulating layer under the gap. Thus, heat generated by the on-chip micro electron source can be dissipated through the electrode and the thermal conductive layer, thereby significantly improving heat dissipation ability of the on-chip miniature electron source.

公开(公告)号：US11189453B2

公开(公告)日：2021-11-30

申请号：US16966907

申请日：2018-12-26

Applicant: 38th Research Institute, China Electronics Technology Group Corporation

Inventor： Huarong Liu ,  Junting Wang ,  Xuehui Wang ,  Yuxuan Qi ,  Xianbin Hu ,  Xueming Jin ,  Zhao Huang ,  Dizhi Chen ,  Yijing Li ,  Youyin Deng

IPC: H01J37/073 ,  H01J3/02 ,  H01J37/065 ,  H01J37/07

Abstract: The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.

公开(公告)号：US11037753B2

公开(公告)日：2021-06-15

申请号：US16450242

申请日：2019-06-24

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/143 ,  H01J3/24 ,  H01J3/02 ,  H01J37/28

Abstract: A magnetically microfocused electron emission source apparatus is disclosed. The apparatus may include a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter. Further, the magnetic emitter unit may include one or more magnetic portions formed from one or more magnetic materials, wherein the one or more magnetic portions of the magnetic emitter unit are configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the electron emitter.

公开(公告)号：US20210098222A1

公开(公告)日：2021-04-01

申请号：US17020277

申请日：2020-09-14

Applicant: KLA Corporation

Inventor： Edgardo Garcia Berrios ,  J. Joseph Armstrong ,  Yinying Xiao-Li ,  John Fielden ,  Yung-Ho Alex Chuang

IPC: H01J1/304 ,  H01J37/073 ,  H01J3/02 ,  H01J37/317 ,  H01J37/28 ,  H01J35/06

Abstract: A light modulated electron source utilizes a photon-beam source to modulate the emission current of an electron beam emitted from a silicon-based field emitter. The field emitter's cathode includes a protrusion fabricated on a silicon substrate and having an emission tip covered by a coating layer. An extractor generates an electric field that attracts free electrons toward the emission tip for emission as part of the electron beam. The photon-beam source generates a photon beam including photons having an energy greater than the bandgap of silicon, and includes optics that direct the photon beam onto the emission tip, whereby each absorbed photon creates a photo-electron that combines with the free electrons to enhance the electron beam's emission current. A controller modulates the emission current by controlling the intensity of the photon beam applied to the emission tip. A monitor measures the electron beam and provides feedback to the controller.

公开(公告)号：US10861666B1

公开(公告)日：2020-12-08

申请号：US16777276

申请日：2020-01-30

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Dieter Winkler

IPC: H01J3/02 ,  H01J37/073

Abstract: A method of operating a charged particle gun is described. The method includes providing an emitter at a first emitter potential within the charged particle gun and providing a trapping electrode at a first electrode potential within the charged particle gun, wherein the first emitter potential and the first electrode potential is provided to have an electrical field of essentially zero at the emitter and at the trapping electrode; switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential to generate an electrostatic trapping field at the trapping electrode; and after switching the trapping electrode from the first electrode potential to the second electrode potential, switching on an electrostatic emission field at the emitter.

公开(公告)号：US10804061B2

公开(公告)日：2020-10-13

申请号：US16329688

申请日：2017-07-24

Applicant: PEKING UNIVERSITY

Inventor： Xianlong Wei ,  Gongtao Wu

IPC: H01J3/02 ,  H01J9/18 ,  H01J1/312 ,  H01J1/304 ,  H01J1/316 ,  H01J9/02 ,  H01J37/073 ,  H01J35/06

Abstract: A tunneling electro source, an array thereof and methods for making the same are provided. The tunneling electron source is a surface tunneling micro electron source having a planar multi-region structure. The tunneling electron source includes an insulating substrate, and two conductive regions and one insulating region arranged on a surface of the insulating substrate. The insulating region is arranged between the two conductive regions and abuts on the two conductive regions. Minimum spacing between the two conductive regions, which equals to a minimum width of the insulating region, is less than 100 nm.

公开(公告)号：US10748731B2

公开(公告)日：2020-08-18

申请号：US15856251

申请日：2017-12-28

Applicant: TSINGHUA UNIVERSITY ,  Nuctech Company Limited

Inventor： Wenhui Huang ,  Dongsheng Zhang ,  Qingxiu Jin ,  Chengjun Tan ,  Donghai Liu ,  Qun Luo ,  Chuanxiang Tang

IPC: H01J3/02 ,  H01J35/06 ,  H01J35/14

Abstract: An electron gun, an X-ray source and a CT device are provided. The electron gun includes a body having a first end portion and a second end portion opposite to each other, wherein the first end portion is a connecting end portion; an internal cavity is formed in the body and has an opening positioned on the second end portion; a cathode, a grid, a compensation electrode and a focus electrode, orderly arranged in the internal cavity in a direction from the first end portion to the second end portion.

公开(公告)号：US10665416B2

公开(公告)日：2020-05-26

申请号：US16039446

申请日：2018-07-19

Applicant: Tokyo Electron Limited

Inventor： Shinji Kubota ,  Naohiko Okunishi ,  Yosuke Tamuro ,  Shota Kaneko

IPC: H01J37/06 ,  H01J3/02 ,  H01J37/32

Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.