发明申请
- 专利标题： Alignment system and method and device manufactured thereby
- 专利标题（中）： 对准系统及其制造方法和装置
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申请号： US10845516申请日： 2004-05-14
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公开(公告)号： US20050254030A1公开(公告)日： 2005-11-17
- 发明人: Hoite Pieter Tolsma , Ramon Navarro Y. Koren , Hubertus Simons , Remi Edart , Pui Lam , Bernardus Hulshof , Roland Adrianus Bogers
- 申请人： Hoite Pieter Tolsma , Ramon Navarro Y. Koren , Hubertus Simons , Remi Edart , Pui Lam , Bernardus Hulshof , Roland Adrianus Bogers
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/42 ; H01L21/027
摘要：
An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.
公开/授权文献
- US07259828B2 Alignment system and method and device manufactured thereby 公开/授权日：2007-08-21
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