公开(公告)号：US20060091330A1

公开(公告)日：2006-05-04

申请号：US11294476

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Koren ,  Hoite Pieter Tolsma ,  Hubertus Johannes Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Koren ,  Hoite Pieter Tolsma ,  Hubertus Johannes Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20090051934A1

公开(公告)日：2009-02-26

申请号：US12216514

申请日：2008-07-07

申请人： Haico Victor Kok ,  Hoite Pieter Tolsma ,  Gerbrand Van Der Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper

发明人： Haico Victor Kok ,  Hoite Pieter Tolsma ,  Gerbrand Van Der Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper

IPC分类号： G01B11/14

CPC分类号： G03F7/70666 ,  G03F7/709 ,  G03F9/7096

摘要： The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

摘要翻译： 本发明提供了一种用于通过在投影平面中的图像位置处投射空中图像来确定振动相关信息的方法，将空间图像的强度映射到图像映射中，该图像映射被布置为包括采样位置的坐标值， 在每个采样位置采样的强度，以及测量通过槽模式接收的空间图像的强度。 该方法还包括从图像映射确定图像映射的斜率部分的检测位置，在斜率部分的检测位置处，测量空中图像的时间强度，以及测量狭槽图案的相对位置和 图像位置，将被测量的时隙的相对位置作为时隙图案的位置相关数据，并根据所述空间图像的空间图像振动相关信息的时间强度确定。

公开(公告)号：US20050254030A1

公开(公告)日：2005-11-17

申请号：US10845516

申请日：2004-05-14

申请人： Hoite Pieter Tolsma ,  Ramon Navarro Y. Koren ,  Hubertus Simons ,  Remi Edart ,  Pui Lam ,  Bernardus Hulshof ,  Roland Adrianus Bogers

发明人： Hoite Pieter Tolsma ,  Ramon Navarro Y. Koren ,  Hubertus Simons ,  Remi Edart ,  Pui Lam ,  Bernardus Hulshof ,  Roland Adrianus Bogers

IPC分类号： G03F7/20 ,  G03B27/42 ,  H01L21/027

CPC分类号： G03B27/42 ,  G03F9/7046

摘要： An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.

摘要翻译： 一种在光刻设备中的衬底上自动选择衬底对准标记的装置和方法，或者覆盖测量装置中的重叠度量目标。 该装置具有连接到处理器的处理器和存储器。 存储器存储可用于选择和选择规则的一组或多组衬底对准标记或重叠测量目标的位置，以从该至少一个组中选择合适的衬底对准标记或重叠度量目标。 选择规则基于关于哪个衬底对准标记或覆盖度量目标位置根据一个或多个选择标准是最佳的实验或理论知识。