发明申请
US20050266589A1 Formation method of electroconductive pattern, and production method of electron-emitting device, electron source, and image display apparatus using this 失效
导电图案的形成方法,电子发射器件的制造方法,电子源和使用该方法的图像显示装置

  • 专利标题: Formation method of electroconductive pattern, and production method of electron-emitting device, electron source, and image display apparatus using this
  • 专利标题(中): 导电图案的形成方法,电子发射器件的制造方法,电子源和使用该方法的图像显示装置
  • 申请号: US11138332
    申请日: 2005-05-27
  • 公开(公告)号: US20050266589A1
    公开(公告)日: 2005-12-01
  • 发明人: Tsuyoshi FuruseShosei MoriMasahiro Terada
  • 申请人: Tsuyoshi FuruseShosei MoriMasahiro Terada
  • 申请人地址: JP TOKYO
  • 专利权人: CANON KABUSHIKI KAISHA
  • 当前专利权人: CANON KABUSHIKI KAISHA
  • 当前专利权人地址: JP TOKYO
  • 优先权: JP2004-162968 20040601
  • 主分类号: H01J9/02
  • IPC分类号: H01J9/02 H01L21/00
Formation method of electroconductive pattern, and production method of electron-emitting device, electron source, and image display apparatus using this
摘要:
In regard to an electroconductive pattern including a high resistivity region partially, by forming a pattern with a photosensitive resin, making the pattern absorb liquid containing a metal component, and baking this, an electroconductive film of metal oxide is formed, this electroconductive film is further covered by a gas shielding layer, and portions which are not shielded are reduced selectively to be made low resistance metal film regions. Since the material which constitutes the electroconductive pattern is hardly removed, a load concerning material reuse is mitigated and material cost is reduced.
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