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发明申请
US20050267308A1 Silicon-containing compound, composition containing said compound, and insulating material 失效
含硅化合物，含有所述化合物的组合物和绝缘材料

Silicon-containing compound, composition containing said compound, and insulating material
摘要：
A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): AnSiX(4-n)  (1) wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.
摘要（中）：

一种用于形成绝缘膜的组合物，其包含由式（1）表示的化合物，由式（1）表示的化合物的水解产物和由式（1）表示的化合物的缩合物中的至少一种：＆lt; -formulae description =“In-line Formulas”end =“lead”？> A SiX（4-n）<1> <？in-line-formula description =“在线公式”end =“tail”？>其中n表示1至3的整数; A表示含有由11个或更多个碳原子形成的笼状结构的任选取代的基团，当n表示2或3的整数时，A相互相同或不同; X表示可水解基团，当n表示1或2的整数时，X相同或不同。

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