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37 条记录 (耗时 0.016 秒)

    Silicon-containing compound, composition containing said compound, and insulating material
    1.
    发明申请
    Silicon-containing compound, composition containing said compound, and insulating material 失效
    含硅化合物，含有所述化合物的组合物和绝缘材料

    公开(公告)号：US20050267308A1

    公开(公告)日：2005-12-01

    申请号：US11138352

    申请日：2005-05-27

    申请人： Kensuke Morita ,  Morio Yagihara ,  Koji Wariishi

    发明人： Kensuke Morita ,  Morio Yagihara ,  Koji Wariishi

    IPC分类号： C07F7/08 ,  C07F7/18 ,  C08L83/04 ,  C09D183/04

    CPC分类号： C07F7/1804

    摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): AnSiX(4-n)  (1) wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.

    摘要翻译： 一种用于形成绝缘膜的组合物，其包含由式（1）表示的化合物，由式（1）表示的化合物的水解产物和由式（1）表示的化合物的缩合物中的至少一种：＆lt; -formulae description =“In-line Formulas”end =“lead”？> A SiX（4-n）<1> <？in-line-formula description =“在线公式”end =“tail”？>其中n表示1至3的整数; A表示含有由11个或更多个碳原子形成的笼状结构的任选取代的基团，当n表示2或3的整数时，A相互相同或不同; X表示可水解基团，当n表示1或2的整数时，X相同或不同。

    Silicon-containing compound, composition containing said compound, and insulating material
    2.
    发明授权
    Silicon-containing compound, composition containing said compound, and insulating material 失效
    含硅化合物，含有所述化合物的组合物和绝缘材料

    公开(公告)号：US07534904B2

    公开(公告)日：2009-05-19

    申请号：US11138352

    申请日：2005-05-27

    申请人： Kensuke Morita ,  Morio Yagihara ,  Koji Wariishi

    发明人： Kensuke Morita ,  Morio Yagihara ,  Koji Wariishi

    IPC分类号： C07F7/18

    CPC分类号： C07F7/1804

    摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): AnSiX(4-n)  (1) wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.

    摘要翻译： 一种用于形成绝缘膜的组合物，其包含由式（1）表示的化合物，由式（1）表示的化合物的水解产物和由式（1）表示的化合物的缩合物中的至少一种：＆lt; -formulae description =“In-line Formulas”end =“lead”？> AnSiX（4-n）（1）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中n 表示1〜3的整数， A表示含有由11个或更多个碳原子形成的笼状结构的任选取代的基团，当n表示2或3的整数时，A相互相同或不同; X表示可水解基团，当n表示1或2的整数时，X相同或不同。

    Composition, film and producing method therefor
    5.
    发明申请
    Composition, film and producing method therefor 失效
    组合物，薄膜及其制备方法

    公开(公告)号：US20070054135A1

    公开(公告)日：2007-03-08

    申请号：US11515014

    申请日：2006-09-05

    申请人： Kensuke Morita ,  Koji Wariishi ,  Kazutaka Takahashi ,  Makoto Muramatsu

    发明人： Kensuke Morita ,  Koji Wariishi ,  Kazutaka Takahashi ,  Makoto Muramatsu

    IPC分类号： B32B9/04 ,  C08G77/20

    CPC分类号： C08G77/20 ,  C08G77/045 ,  C09D183/04 ,  Y10T428/31663

    摘要： A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.

    摘要翻译： 一种组合物，其包含：含有m个RSi（O <0.5>）3个单元的化合物（I）的聚合物，其中m表示8至16的整数 ; 并且R各自独立地表示不可水解基团，条件是R中的至少两个表示含有乙烯基或乙炔基的基团，并且其中每个RSi（O） 通过在RSi（O）3单体中的每一个中共享氧原子将3个单元连接到另一个RSi（O < 0.5），以形成笼结构，并且其中在组合物中含有的固体组分中，通过化合物（I）的反应形成的聚合物质表示60 质量％以上。

    Film forming composition, insulating film and production process of the insulating film
    7.
    发明申请
    Film forming composition, insulating film and production process of the insulating film 审中-公开
    绝缘膜的成膜组合物，绝缘膜和制造工艺

    公开(公告)号：US20070054136A1

    公开(公告)日：2007-03-08

    申请号：US11515818

    申请日：2006-09-06

    申请人： Kazutaka Takahashi ,  Koji Wariishi ,  Kensuke Morita

    发明人： Kazutaka Takahashi ,  Koji Wariishi ,  Kensuke Morita

    IPC分类号： B32B9/04 ,  C07F7/18

    CPC分类号： C09D183/14 ,  Y10T428/31663

    摘要： A film forming composition comprising: at least one of a compound represented by formula (I) as defined in the specification, a hydrolysate of the compound represented by formula (I) and a polycondensate of the compound represented by formula (I); and a silicon surfactant, a production process of an insulating film by using the composition and the insulating film.

    摘要翻译： 一种成膜组合物，其包含：如本说明书中定义的由式（I）表示的化合物中的至少一种，由式（I）表示的化合物的水解产物和由式（I）表示的化合物的缩聚物; 硅表面活性剂，使用该组合物和绝缘膜的绝缘膜的制造方法。

    Composition, film and producing method therefor
    8.
    发明授权
    Composition, film and producing method therefor 失效
    组合物，薄膜及其制备方法

    公开(公告)号：US07820777B2

    公开(公告)日：2010-10-26

    申请号：US11515014

    申请日：2006-09-05

    申请人： Kensuke Morita ,  Koji Wariishi ,  Kazutaka Takahashi ,  Makoto Muramatsu

    发明人： Kensuke Morita ,  Koji Wariishi ,  Kazutaka Takahashi ,  Makoto Muramatsu

    IPC分类号： C08G77/442 ,  B32B9/04 ,  H01L21/31 ,  H01L21/469

    CPC分类号： C08G77/20 ,  C08G77/045 ,  C09D183/04 ,  Y10T428/31663

    摘要： A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.

    摘要翻译： 一种组合物，其包含：含有m个RSi（O0.5）3单元的化合物（I）的聚合物，其中m表示8〜16的整数; 并且R各自独立地表示不可水解基团，条件是R 1中的至少两个表示含有乙烯基或乙炔基的基团，并且其中每个RSi（O0.5）3单元连接到另一个 RSi（O0.5）3单元，通过在RSi（O0.5）3单元中的每一个中共享氧原子，以形成笼结构，并且其中在组合物中包含的固体组分中形成聚合物质 化合物（I）的反应为60质量％以上。

    APPARATUS, METHOD, PROGRAM, AND RECORDING MEDIUM FOR SUPPORTING ARRANGEMENT OF OPERATION AREAS LAYOUT
    9.
    发明申请
    APPARATUS, METHOD, PROGRAM, AND RECORDING MEDIUM FOR SUPPORTING ARRANGEMENT OF OPERATION AREAS LAYOUT 失效
    用于支持运营安排的装置，方法，程序和记录介质区域布局

    公开(公告)号：US20110029098A1

    公开(公告)日：2011-02-03

    申请号：US12844949

    申请日：2010-07-28

    申请人： Yoshibumi FUKUDA ,  Takeshi Yokota ,  Hisanori Nonaka ,  Norito Watanabe ,  Toshiyuki Miyake ,  Kenji Akagi ,  Kensuke Morita

    发明人： Yoshibumi FUKUDA ,  Takeshi Yokota ,  Hisanori Nonaka ,  Norito Watanabe ,  Toshiyuki Miyake ,  Kenji Akagi ,  Kensuke Morita

    IPC分类号： G05B11/01

    CPC分类号： G05B19/41885 ,  G05B2219/32085 ,  Y02P90/20 ,  Y02P90/24 ,  Y02P90/26

    摘要： An apparatus for supporting arrangement of operation areas layout includes: a storage unit that stores therein data on a position, a shape, and a use period of each operation area which has already been arranged in a prescribed site; a display control unit that references the data stored in the storage unit and makes a display unit display a top view illustrating arrangement of the operation areas at a given point of time on a temporal axis; and an operation areas layout arrangement processing unit that receives an input of a data on a position, a shape, and a use period of an operation area to be added into the prescribed site, references the data stored in the storage unit, and, if the received and added operation area is not determined to interfere with other already-arranged operation area, stores the data on the added operation area in the storage unit.

    摘要翻译： 一种用于支持操作区域布置布置的装置包括：存储单元，其中存储已经布置在规定位置的每个操作区域的位置，形状和使用周期的数据; 显示控制单元，其参考存储在存储单元中的数据，并使显示单元显示在时间轴上给定时间点上的操作区域的布置的俯视图; 以及操作区域布置处理单元，其接收对要添加到规定场所的操作区域的位置，形状和使用期间的数据的输入，引用存储在存储单元中的数据，如果 接收和添加的操作区域不被确定为干扰其他已经布置的操作区域，将数据存储在存储单元中的添加的操作区域上。

    Process for producing 4,9-dibromodiamantane
    10.
    发明授权
    Process for producing 4,9-dibromodiamantane 有权
    生产4,9-二溴二聚烷烃的方法

    公开(公告)号：US07872164B2

    公开(公告)日：2011-01-18

    申请号：US12440672

    申请日：2007-09-25

    申请人： Katsuyuki Watanabe ,  Kensuke Morita ,  Masaya Nakayama

    发明人： Katsuyuki Watanabe ,  Kensuke Morita ,  Masaya Nakayama

    IPC分类号： C07C17/093

    CPC分类号： C07C17/10 ,  C07C23/46

    摘要： A process for selectively producing 4,9-dibromodiamantane includes a step of reacting diamantane with bromine in the presence of a Lewis acid and a solvent, wherein the solvent comprises a substituted or unsubstituted, straight-chain, branched-chain or cyclic saturated hydrocarbon containing from 3 to 10 carbon atoms, and a reaction solution after the step satisfies Formula (1): A/(A+B+C+D+E)>0.80   Formula (1) wherein A represents an area ratio (%) of 4,9-dibromodiamantane obtained by gas chromatography of the reaction solution, B represents an area ratio of diamantane, C represents a sum of an area ratio of 1-bromodiamantane and an area ratio of 4-bromodiamantane, D represents an area ratio of tribromodiamantane, and E represents a sum of an area ratio of 1,6-dibromodiamantane and an area ratio of 1,4-dibromodiamantane.

    摘要翻译： 选择性生产4,9-二溴二聚烷烃的方法包括在路易斯酸和溶剂存在下使二金刚烷与溴反应的步骤，其中溶剂包括取代或未取代的直链，支链或环状饱和烃 3〜10个碳原子，后述的反应溶液满足式（1）：A /（A + B + C + D + E）> 0.80式（1）其中A表示面积比（％）为4 ，通过反应溶液的气相色谱法获得的9-二溴二聚烷烃，B表示金刚烷的面积比，C表示1-溴二胺的面积比和4-溴二胺的面积比的总和，D表示三溴二甲烷的面积比， E表示1,6-二溴二甲烷的面积比和1,4-二溴二聚烷的面积比之和。