发明申请
- 专利标题: Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof
- 专利标题(中): 波前测量干涉仪装置及其光束测量装置及方法
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申请号: US11144709申请日: 2005-06-06
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公开(公告)号: US20050270543A1公开(公告)日: 2005-12-08
- 发明人: Zongtao Ge , Takayuki Saito , Minoru Kurose
- 申请人: Zongtao Ge , Takayuki Saito , Minoru Kurose
- 申请人地址: JP Saitama-shi
- 专利权人: Fujinon Corporation
- 当前专利权人: Fujinon Corporation
- 当前专利权人地址: JP Saitama-shi
- 优先权: JP2004-168965 20040607; JP2004-168966 20040607; JP2005-128344 20050426
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01J1/42 ; G01J9/02 ; G02B5/00
摘要:
The light beam measurement apparatus comprises a beam splitter that divides a light beam emitted from a light source unit into two luminous fluxes, a semi-transmitting/reflecting surface that reflects part of one of the divided luminous fluxes back in the opposite direction to the direction of incidence as a sample luminous flux, and reflection-type reference light producing means that converts part of the luminous flux transmitted through the semi-transmitting/reflecting surface into a wavefront-shaped reference luminous flux and outputs this reference luminous flux; this light beam measurement apparatus can carry out both wavefront measurement and light beam spot characteristic measurement on a light beam simultaneously.
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