发明申请
US20050271421A1 Calibration method for exposure device, exposure method and exposure device
审中-公开
曝光装置的校准方法,曝光方法和曝光装置
- 专利标题: Calibration method for exposure device, exposure method and exposure device
- 专利标题(中): 曝光装置的校准方法,曝光方法和曝光装置
-
申请号: US11094504申请日: 2005-03-31
-
公开(公告)号: US20050271421A1公开(公告)日: 2005-12-08
- 发明人: Hiroshi Uemura , Takeshi Fukuda
- 申请人: Hiroshi Uemura , Takeshi Fukuda
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 优先权: JP2004-107120 20040331
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03G15/04 ; G03G15/043
摘要:
In this exposure system, alignment marks on a photosensitive material are photographed with a reading unit. Prior to this photographing, a standard board, having detection marks at positions readable to the reading unit at preset intervals along the movement direction of the reading unit, is provided. At least one of the detection marks is photographed with the reading unit, which is arranged in a position to photograph the alignment marks provided on the photosensitive material. Calibration data is calculated based on data on the camera optical axis deviation obtained by this photographing. Standard position data reflects the calibration data, whereby calibration of the exposure position adjustment function of the exposure device is performed.
信息查询
IPC分类: