发明申请
US20050272268A1 Method of producing substrate having patterned organosilane layer and method of using the substrate having the patterned organosilane layer
有权
具有图案化有机硅烷层的基材的制造方法和使用具有图案化有机硅烷层的基材的方法
- 专利标题： Method of producing substrate having patterned organosilane layer and method of using the substrate having the patterned organosilane layer
- 专利标题（中）： 具有图案化有机硅烷层的基材的制造方法和使用具有图案化有机硅烷层的基材的方法
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申请号： US11130756申请日： 2005-05-17
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公开(公告)号： US20050272268A1公开(公告)日： 2005-12-08
- 发明人: Kyu-youn Hwang , Ji-na Namgoong , Jeo-young Shim
- 申请人： Kyu-youn Hwang , Ji-na Namgoong , Jeo-young Shim
- 优先权： KR10-2004-0039983 20040602
- 主分类号： H01L27/12
- IPC分类号： H01L27/12 ; B01J19/00 ; G01N33/543 ; H01L21/31 ; H01L21/469
摘要：
Provided are a method of producing a substrate having a patterned organosilane layer and a method of using the substrate having the patterned organosilane layer. The method of producing the substrate having the patterned organosilane layer, includes: coating organosilane on a substrate to obtain an organosilane layer; coating a photoresist material on the organosilane layer; exposing the photoresist material to light through a mask to obtain a patterned surface on the photoresist material; developing an exposed or unexposed region of the photoresist material using a developer; and wet etching a portion of the organosilane layer in the region from which the photoresist material has been removed, using a HF-containing solution as an etchant.
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