发明申请
- 专利标题： Semiconductor device with scattering bars adjacent conductive lines
- 专利标题（中）： 具有相邻导线的散射棒的半导体器件
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申请号： US10867076申请日： 2004-06-14
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公开(公告)号： US20050277067A1公开(公告)日： 2005-12-15
- 发明人: Kuei Shun Chen , Chin-Hsiang Lin , Yung-Sung Yen , Chih-Ming Lai
- 申请人： Kuei Shun Chen , Chin-Hsiang Lin , Yung-Sung Yen , Chih-Ming Lai
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; H01L21/311 ; H01L21/768
摘要：
A semiconductor device and method of manufacture thereof wherein scattering bars are disposed on both sides of an isolated conductive line of a semiconductor device to improve the lithography results. The scattering bars have a sufficient width and are spaced a sufficient distance from the isolated conductive line so as to increase the depth of focus of the isolated conductive line during the patterning of the semiconductor device. The scattering bars are left remaining in the finished semiconductor device after the manufacturing process is completed.
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