发明申请
US20050282306A1 Method and apparatus for producing ultra-thin semiconductor chip and method and apparatus for producing ultra-thin back-illuminated solid-state image pickup device
失效
用于制造超薄半导体芯片的方法和装置以及用于制造超薄背照明固态图像拾取装置的方法和装置
- 专利标题: Method and apparatus for producing ultra-thin semiconductor chip and method and apparatus for producing ultra-thin back-illuminated solid-state image pickup device
- 专利标题(中): 用于制造超薄半导体芯片的方法和装置以及用于制造超薄背照明固态图像拾取装置的方法和装置
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申请号: US11196967申请日: 2005-08-04
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公开(公告)号: US20050282306A1公开(公告)日: 2005-12-22
- 发明人: Hideo Yamanaka
- 申请人: Hideo Yamanaka
- 专利权人: SONY CORPORATION
- 当前专利权人: SONY CORPORATION
- 优先权: JPJP2002-299563 20021011
- 主分类号: H01L27/14
- IPC分类号: H01L27/14 ; H01L21/00 ; H01L21/46 ; H01L23/00 ; H01L27/146 ; H01L27/148
摘要:
A method of production of an ultra-thin semiconductor chip and an ultra-thin back-illuminated solid-state image pickup device utilizing a semiconductor layer formed on a support substrate via an insulating layer to improve separation performance of a semiconductor layer from a support substrate and thereby improve the productivity and quality-including the steps of forming a base comprised of a support substrate on which a porous layer or other peeling layer, a second semiconductor layer, an insulating layer, and a first semiconductor layer are stacked; forming solid-state image pickup sensor units and projecting connection electrodes to be connected to the solid-state image pickup sensor units in the first semiconductor layer; forming scores reaching the peeling layer along separation lines for separation into individual solid-state image pickup devices; forming a resin protective film filling the scores, covering the first semiconductor layer, and exposing the connection electrodes; peeling off the support substrate via the peeling layer as an interface; and cutting from the second semiconductor layer side along the resin protective film filled in the scores to separate individual solid-state image pickup devices.
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