发明申请
- 专利标题: Substrate processing apparatus and substrate processing method which performs predetermined processing on a substrate which is positioned approximately horizontally at a substrate processing position
- 专利标题(中): 基板处理装置和基板处理方法,其对大致水平放置在基板处理位置的基板进行规定的处理
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申请号: US11132565申请日: 2005-05-19
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公开(公告)号: US20050284369A1公开(公告)日: 2005-12-29
- 发明人: Katsuhiko Miya , Eiji Fukatsu
- 申请人: Katsuhiko Miya , Eiji Fukatsu
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 优先权: JP2004-187557 20040625
- 主分类号: B05C11/02
- IPC分类号: B05C11/02 ; B05C13/00 ; B05C13/02 ; H01L21/677 ; H01L21/683
摘要:
As a substrate transportation robot transports an unprocessed substrate W to a substrate transfer position P1, inert gas ejected from a substrate floating head 71 toward the bottom surface of the substrate W floats up the unprocessed substrate W. Driven by an actuator 74, the substrate floating head 71 floating up the unprocessed substrate W then moves down. Upon arrival of the unprocessed substrate W at a substrate processing position P3, a bottom rim portion of the substrate W engages with support pins 3, and as the substrate floating head 71 further moves down, the unprocessed substrate W is transferred to and mounted on the support pins 3. The substrate W is thus positioned at the substrate processing position P3, whereby the bottom rim portion of the substrate W and an opposing surface 5b of a spin base 5 are positioned close to each other and opposed against each other.
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