发明申请
- 专利标题： Processing system and method for chemically treating a tera layer
- 专利标题（中）： 用于化学处理层的处理系统和方法
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申请号： US10883784申请日： 2004-07-06
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公开(公告)号： US20060006136A1公开(公告)日： 2006-01-12
- 发明人: Aelan Mosden , Asao Yamashita
- 申请人： Aelan Mosden , Asao Yamashita
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 主分类号： B44C1/22
- IPC分类号： B44C1/22 ; H01L21/311
摘要：
A processing system and method for chemically treating a TERA layer on a substrate. The chemical treatment of the substrate chemically alters exposed surfaces on the substrate. In one embodiment, the system for processing a TERA layer includes a plasma-enhanced chemical vapor deposition (PECVD) system for depositing the TERA layer on the substrate, an etching system for creating features in the TERA layer, and a processing subsystem for reducing the size of the features in the TERA layer.