发明申请
- 专利标题: Defect repair device and defect repair method
- 专利标题(中): 缺陷修复装置和缺陷修复方法
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申请号: US10885641申请日: 2004-07-08
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公开(公告)号: US20060007433A1公开(公告)日: 2006-01-12
- 发明人: Yoshiaki Ikuta , Toshiyuki Uno
- 申请人: Yoshiaki Ikuta , Toshiyuki Uno
- 申请人地址: JP Tokyo
- 专利权人: ASAHI GLASS COMPANY LTD.
- 当前专利权人: ASAHI GLASS COMPANY LTD.
- 当前专利权人地址: JP Tokyo
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A defect repair device includes a defect inspection unit configured to find a size of a protruding defect on a front surface of a multi-layer film having a rear surface opposite to the front surface, a calculation unit configured to calculate a repair energy so as to repair the protruding defect based on the size of the protruding defect found by the defect inspection unit, an energy supplier, and an energy controller configured to control the energy supplier to supply the repair energy calculated by the calculation unit to a portion in the multi-layer film from the rear surface of the multi-layer film so as to cause a decrease in a volume of the portion and retract the protruding defect into the multi-layer film.
公开/授权文献
- US07230695B2 Defect repair device and defect repair method 公开/授权日:2007-06-12
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