- 专利标题: Pattern inspecting method
-
申请号: US11175360申请日: 2005-07-07
-
公开(公告)号: US20060018530A1公开(公告)日: 2006-01-26
- 发明人: Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
- 申请人: Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2004-208314 20040715
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.
公开/授权文献
- US07590277B2 Pattern inspecting method 公开/授权日:2009-09-15
信息查询