发明申请
US20060030030A1 Programmable mask and method of fabricating biomolecule array using the same
失效
可编程掩模和使用其制造生物分子阵列的方法
- 专利标题: Programmable mask and method of fabricating biomolecule array using the same
- 专利标题(中): 可编程掩模和使用其制造生物分子阵列的方法
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申请号: US11100544申请日: 2005-04-07
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公开(公告)号: US20060030030A1公开(公告)日: 2006-02-09
- 发明人: Moon Jung , Dong Shin , Young Kim , Se Park , Hyeon Pyo , Chang Choi
- 申请人: Moon Jung , Dong Shin , Young Kim , Se Park , Hyeon Pyo , Chang Choi
- 专利权人: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- 当前专利权人: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- 优先权: KR2004-61275 20040804
- 主分类号: C12M1/34
- IPC分类号: C12M1/34 ; G02F1/13
摘要:
The present invention relates to a programmable mask used in a photolithography process for fabricating a biomolecule array and a method of fabricating a biomolecule array using the same and, more particularly, to a programmable mask which can increase a contrast ratio of transmittance versus shielding of light incident to a liquid crystal which constitutes each pixel by irradiating parallel ultraviolet (“UV”) light generated from an external parallel light exposure device to a certain cell and using a vertically aligned liquid crystal panel or an LC panel having no spacer, and a method of fabricating a biomolecule array using the same.