发明申请
- 专利标题: Composition for preparing nanoporous material
- 专利标题(中): 用于制备纳米多孔材料的组合物
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申请号: US11002187申请日: 2004-12-03
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公开(公告)号: US20060040509A1公开(公告)日: 2006-02-23
- 发明人: Jin Yim , Byoung Choi , Duk An
- 申请人: Jin Yim , Byoung Choi , Duk An
- 申请人地址: KR Suwon-Si
- 专利权人: SAMSUNG CORNING CO., LTD.
- 当前专利权人: SAMSUNG CORNING CO., LTD.
- 当前专利权人地址: KR Suwon-Si
- 优先权: KR2004-64641 20040817
- 主分类号: H01L21/31
- IPC分类号: H01L21/31
摘要:
Disclosed herein is a composition for preparing a nanoporous material. The composition comprises i) a cyclodextrin derivative, ii) a thermostable matrix precursor, and iii) a solvent for dissolving the components i) and ii). The composition enables the preparation of a low dielectric constant film in which nanopores with a size of 20 Å or less are uniformly distributed.
公开/授权文献
- US07459549B2 Composition for preparing nanoporous material 公开/授权日:2008-12-02
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