发明申请
US20060060465A1 Apparatus for forming nanoholes and method for forming nanoholes
失效
用于形成纳米孔的装置和形成纳米孔的方法
- 专利标题： Apparatus for forming nanoholes and method for forming nanoholes
- 专利标题（中）： 用于形成纳米孔的装置和形成纳米孔的方法
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申请号： US11002266申请日： 2004-12-03
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公开(公告)号： US20060060465A1公开(公告)日： 2006-03-23
- 发明人: Junichi Sato , Hajime Amano , Fujimi Kimura
- 申请人： Junichi Sato , Hajime Amano , Fujimi Kimura
- 申请人地址： JP Tokyo
- 专利权人： TDK CORPORATION
- 当前专利权人： TDK CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2003-423359 20031219
- 主分类号： C23C14/00
- IPC分类号： C23C14/00 ; C23C14/32
摘要：
A vacuum chamber 1 has a plasma generating space 11 in its interior. A magnetic field generating means 4 applies a fluctuating magnetic field to the plasma generating space 11 to cause plasma there to fluctuate. A substrate 6 is placed in the plasma generating space 11 so that when a potential difference is evoked between a first conductor 61 and a second conductor 62 as a result of the fluctuation of plasma, the potential difference can cause nanoholes to be formed in the substrate 6.
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