- 专利标题: Semiconductor device and method for forming the same
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申请号: US11205311申请日: 2005-08-17
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公开(公告)号: US20060060860A1公开(公告)日: 2006-03-23
- 发明人: Shunpei Yamazaki , Akira Mase , Masaaki Hiroki , Yasuhiko Takemura , Hongyong Zhang , Hideki Uochi , Hideki Nemoto
- 申请人: Shunpei Yamazaki , Akira Mase , Masaaki Hiroki , Yasuhiko Takemura , Hongyong Zhang , Hideki Uochi , Hideki Nemoto
- 申请人地址: JP Atsugi-shi
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi
- 优先权: JP3-237100 19910823; JP3-340336 19911129; JP4-34194 19920124; JP4-38637 19920129; JP4-54322 19920205
- 主分类号: H01L29/04
- IPC分类号: H01L29/04
摘要:
An insulated-gate field-effect transistor adapted to be used in an active-matrix liquid-crystal display. The channel length, or the distance between the source region and the drain region, is made larger than the length of the gate electrode taken in the longitudinal direction of the channel. Offset regions are formed in the channel region on the sides of the source and drain regions. No or very weak electric field is applied to these offset regions from the gate electrode.
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