发明申请
- 专利标题: Interconnection structure of integrated circuit chip
- 专利标题(中): 集成电路芯片的互连结构
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申请号: US11195361申请日: 2005-08-01
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公开(公告)号: US20060060970A1公开(公告)日: 2006-03-23
- 发明人: Se-Young Jeong , Sung-Min Sim , Soon-Bum Kim , In-Young Lee , Young-Hee Song
- 申请人: Se-Young Jeong , Sung-Min Sim , Soon-Bum Kim , In-Young Lee , Young-Hee Song
- 申请人地址: KR Suwon-Si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-Si
- 优先权: KR2004-60188 20040730
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
An interconnection structure includes an integrated circuit (IC) chip having internal circuitry and a terminal to electrically connect the internal circuitry to an external circuit, a passivation layer disposed on a top surface of the IC chip, the passivation layer configured to protect the internal circuitry and to expose the terminal, an input/output (I/O) pad, where the I/O pad includes a first portion in contact with the terminal and a second portion that extends over the passivation layer, and an electroless plating layer disposed on the I/O pad.
公开/授权文献
- US07307342B2 Interconnection structure of integrated circuit chip 公开/授权日:2007-12-11
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