发明申请
- 专利标题： Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus
- 专利标题（中）： 具有污染物捕获系统的光刻设备，污染捕获系统，装置制造方法和改进光刻设备中污染物捕获的方法
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申请号： US10944422申请日： 2004-09-20
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公开(公告)号： US20060061740A1公开(公告)日： 2006-03-23
- 发明人: Levinus Bakker , Vadim Banine , Arnoud Wassink
- 申请人： Levinus Bakker , Vadim Banine , Arnoud Wassink
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A lithographic apparatus includes an illumination system configured to condition a radiation beam substantially from a light emitting point. The illumination system includes a contaminant trapping system. The trapping system includes a contaminant trap having a central zone and a peripheral zone. The trap includes a plurality of platelets that extend substantially outwards through the peripheral zone. The light emitting point is in a plane with which the platelets coincide. Each of the platelets has a normal with a component directed towards the central zone.
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