公开(公告)号：US20060175558A1

公开(公告)日：2006-08-10

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

发明人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

IPC分类号： G03B7/20

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

公开(公告)号：US20060061740A1

公开(公告)日：2006-03-23

申请号：US10944422

申请日：2004-09-20

申请人： Levinus Bakker ,  Vadim Banine ,  Arnoud Wassink

发明人： Levinus Bakker ,  Vadim Banine ,  Arnoud Wassink

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70058

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam substantially from a light emitting point. The illumination system includes a contaminant trapping system. The trapping system includes a contaminant trap having a central zone and a peripheral zone. The trap includes a plurality of platelets that extend substantially outwards through the peripheral zone. The light emitting point is in a plane with which the platelets coincide. Each of the platelets has a normal with a component directed towards the central zone.

摘要翻译： 光刻设备包括被配置为基本上从发光点调节辐射束的照明系统。 照明系统包括污染物捕集系统。 捕集系统包括具有中心区域和周边区域的污染物阱。 捕获器包括多个基本上向外延伸通过周边区域的血小板。 发光点在与血小板重合的平面中。 每个血小板具有正常的，部件指向中心区。

公开(公告)号：US20070018118A1

公开(公告)日：2007-01-25

申请号：US11481252

申请日：2006-07-06

申请人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Verpalen ,  Antonius Van De Pas ,  Paul Peter Anna Brom

发明人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Verpalen ,  Antonius Van De Pas ,  Paul Peter Anna Brom

IPC分类号： A61N5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板可以相对于辐射束的光轴基本上径向定向。 污染物阱可以设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

公开(公告)号：US20060261290A1

公开(公告)日：2006-11-23

申请号：US11133460

申请日：2005-05-20

申请人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

发明人： Maarten Wilhelmus Van Herpen ,  Vadim Banine ,  Arnoud Wassink ,  Derk Klunder

IPC分类号： A61N5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166

摘要： A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.

摘要翻译： 公开了一种用于在光刻设备中提供投影辐射束的辐射系统。 辐射系统包括用于提供EUV辐射的EUV源，以及包括用于捕获来自EUV源的污染物质的多个箔板的污染屏障。 箔板以光学关闭的布置布置，使得至少一个箔片板反射至少一次通过污染屏障的EUV辐射。

公开(公告)号：US20070023706A1

公开(公告)日：2007-02-01

申请号：US11175036

申请日：2005-07-06

申请人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Van De Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Louis Verpalen ,  Antonius Van De Pas

发明人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Van De Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Louis Verpalen ,  Antonius Van De Pas

IPC分类号： G01J3/10

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板相对于辐射束的光轴基本上径向定向。 污染物陷阱设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

公开(公告)号：US20060219950A1

公开(公告)日：2006-10-05

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US20050133727A1

公开(公告)日：2005-06-23

申请号：US10740829

申请日：2003-12-22

申请人： Vadim Banine ,  Levinus Bakker ,  Johannes Hubertus Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Sidelnikov ,  Marcel Mathijs Dierichs ,  Marius Ravensbergen

发明人： Vadim Banine ,  Levinus Bakker ,  Johannes Hubertus Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Sidelnikov ,  Marcel Mathijs Dierichs ,  Marius Ravensbergen

IPC分类号： G03F7/20 ,  H01J3/14

CPC分类号： G03F7/70916 ,  G03F7/7085

摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

摘要翻译： 用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号 辐射通量和部件污染之一。 仪表被配置为测量检测器信号。 检测器包括至少一根线。

公开(公告)号：US20050122491A1

公开(公告)日：2005-06-09

申请号：US10985037

申请日：2004-11-10

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Vladimir Krivtsun

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Vladimir Krivtsun

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投影到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

公开(公告)号：US20070146659A1

公开(公告)日：2007-06-28

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

发明人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US20070140910A1

公开(公告)日：2007-06-21

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

发明人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

IPC分类号： G01N33/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。