Invention Application
- Patent Title: Refractory metal substrate with improved thermal conductivity
- Patent Title (中): 具有改善导热性的耐火金属基材
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Application No.: US10978940Application Date: 2004-11-01
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Publication No.: US20060091552A1Publication Date: 2006-05-04
- Inventor: Henry Breit , Rong-Chein Wu , Prabhat Kumar
- Applicant: Henry Breit , Rong-Chein Wu , Prabhat Kumar
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A substrate for semiconductor and integrated circuit components including: a core plate containing a Group VIB metal from the periodic table of the elements and/or an anisotropic material, having a first major surface and a second major surface and a plurality of openings extending, at least partially, from the first major surface to the second major surface; and a Group IB metal from the periodic table of the elements or other high thermally conductive material filling at least a portion of the space encompassed by at least some of the openings; and optionally, a layer containing a Group IB metal from the periodic table or other high thermally conductive material disposed over at least a portion of the first major surface and at least a portion of the second major surface. The substrate can be used in electronic devices, which can also include one or more semiconductor components.
Public/Granted literature
- US07416789B2 Refractory metal substrate with improved thermal conductivity Public/Granted day:2008-08-26
Information query
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