发明申请
- 专利标题： Method of resetting substrate processing apparatus, storage medium storing program for implementing the method, and substrate processing apparatus
- 专利标题（中）： 复位基板处理装置的方法，实现该方法的存储介质存储程序和基板处理装置
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申请号： US11270775申请日： 2005-11-10
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公开(公告)号： US20060100825A1公开(公告)日： 2006-05-11
- 发明人: Hajime Furuya , Hideki Tanaka , Tomoya Okubo , Ryoko Kobayashi
- 申请人： Hajime Furuya , Hideki Tanaka , Tomoya Okubo , Ryoko Kobayashi
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2004-327076 20041110
- 主分类号： G06F11/30
- IPC分类号： G06F11/30
摘要：
A method of resetting a substrate processing apparatus having a chamber which is capable of carrying out abnormality judgment on the substrate processing apparatus accurately without causing a decrease in the utilization ratio of the substrate processing apparatus. The chamber is evacuated. A temperature in the chamber is set. Whether or not there is an abnormality in the chamber is judged. An atmosphere in the chamber is stabilized so as to conform to predetermined processing conditions. At least one selected from data that change in response to a change in a state inside the chamber is measured. The measured data is compared with reference data that corresponds to the measured data for a normal state in the chamber.
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