发明申请
- 专利标题: Fabrication system and fabrication method
- 专利标题(中): 制造系统及制造方法
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申请号: US11320778申请日: 2005-12-30
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公开(公告)号: US20060111805A1公开(公告)日: 2006-05-25
- 发明人: Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
- 申请人: Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
- 专利权人: RENESAS TECHNOLOGY CORP.
- 当前专利权人: RENESAS TECHNOLOGY CORP.
- 优先权: JP5-215489 19930831; JP5-175114 19930715
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
A fabricating method for a system including a plurality of processing apparatuses connected to each other by an inter-apparatus transporter. The semiconductor waters are processed in the processing apparatuses and are transported to specified processing apparatuses in different time interval that are set to N times a unit time interval. Since the fabricating system includes processing apparatuses and an inter-apparatus transporter that are periodically controlled at time intervals related to a unit time, intervals related to a unit time, the scheduling of a plurality of works can be made efficiently to enhance the level of optimization, thus improving the productivity.
公开/授权文献
- US07310563B2 Fabrication system and fabrication method 公开/授权日:2007-12-18
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