- 专利标题： Interferometric analysis method for the manufacture of nano-scale devices
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申请号： US11000321申请日： 2004-11-30
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公开(公告)号： US20060114450A1公开(公告)日： 2006-06-01
- 发明人: Pawan Nimmakayala , Tom Rafferty , Alireza Aghili , Byung-Jin Choi , Philip Schumaker , Daniel Babbs , Van Truskett
- 申请人： Pawan Nimmakayala , Tom Rafferty , Alireza Aghili , Byung-Jin Choi , Philip Schumaker , Daniel Babbs , Van Truskett
- 专利权人： Molecular Imprints, Inc.
- 当前专利权人： Molecular Imprints, Inc.
- 主分类号： G01C3/08
- IPC分类号： G01C3/08 ; G01C1/00 ; G01B11/26 ; B28B7/36
摘要：
The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
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