发明申请
- 专利标题： Interferometric analysis for the manufacture of nano-scale devices
- 专利标题（中）： 纳米级器件制造的干涉分析
-
申请号： US11000331申请日： 2004-11-30
-
公开(公告)号： US20060126058A1公开(公告)日： 2006-06-15
- 发明人: Pawan Nimmakayala , Tom Rafferty , Alireza Aghili , Byung-Jin Choi , Philip Schumaker , Daniel Babbs
- 申请人： Pawan Nimmakayala , Tom Rafferty , Alireza Aghili , Byung-Jin Choi , Philip Schumaker , Daniel Babbs
- 专利权人： Molecular Imprints, Inc.
- 当前专利权人： Molecular Imprints, Inc.
- 主分类号： G01B11/26
- IPC分类号： G01B11/26 ; G01B11/14
摘要：
The present invention features a system to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The system senses relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
公开/授权文献
信息查询
