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    System for varying dimensions of a substrate during nanoscale manufacturing
    3.
    发明申请
    System for varying dimensions of a substrate during nanoscale manufacturing 有权
    在纳米级制造期间用于改变衬底尺寸的系统

    公开(公告)号：US20060001194A1

    公开(公告)日：2006-01-05

    申请号：US11142808

    申请日：2005-06-01

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    IPC分类号： B29C59/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03B27/58

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting Forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的衬底卡盘感测到的结果力的大小。

    Apparatus to vary dimensions of a substrate during nano-scale manufacturing
    4.
    发明申请
    Apparatus to vary dimensions of a substrate during nano-scale manufacturing 有权
    用于在纳米级制造期间改变衬底尺寸的装置

    公开(公告)号：US20060001857A1

    公开(公告)日：2006-01-05

    申请号：US11142839

    申请日：2005-06-01

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    IPC分类号： G03B27/58

    CPC分类号： G03F7/0002 ,  B82Y10/00

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

    System for magnification and distortion correction during nano-scale manufacturing
    5.
    发明申请
    System for magnification and distortion correction during nano-scale manufacturing 审中-公开
    纳米尺寸制造中的放大和失真校正系统

    公开(公告)号：US20050270516A1

    公开(公告)日：2005-12-08

    申请号：US10999898

    申请日：2004-11-30

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan Nimmakayala ,  Mario Meissl ,  Sidlgata Sreenivasan

    IPC分类号： B29C43/02 ,  B81C99/00 ,  G03B27/58 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03B27/58

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

    Substrate support method
    7.
    发明申请
    Substrate support method 有权
    基板支持方法

    公开(公告)号：US20050266587A1

    公开(公告)日：2005-12-01

    申请号：US11136886

    申请日：2005-05-25

    申请人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

    发明人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

    IPC分类号： C23F1/00 ,  G03F7/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/687

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/6875

    摘要： The present invention includes a method for supporting a substrate that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the chuck body to move with respect to the plane. To that end, the method includes disposing the substrate upon two spaced-apart bodies; and moving one of the two spaced-apart bodies away from the substrate.

    摘要翻译： 本发明包括一种用于支撑基板的方法，该基板具有带有主体表面的卡盘主体，其具有从其延伸的销具有位于平面中的接触表面，该销可移动地联接到卡盘主体相对于该平面运动 。 为此，该方法包括将基板设置在两个间隔开的主体上; 并将两个间隔开的物体中的一个远离衬底移动。

    Substrate support system
    8.
    发明申请
    Substrate support system 有权
    基板支撑系统

    公开(公告)号：US20050263249A1

    公开(公告)日：2005-12-01

    申请号：US11136885

    申请日：2005-05-25

    申请人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

    发明人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

    IPC分类号： C23F1/00 ,  G03F7/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/687

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/6875

    摘要： The present invention includes a substrate support system that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the chuck body to move with respect to the plane. As a result the substrate support system attenuates if not avoids generating non-planarity in a substrate that results from a presence of particulate contaminants. This is achieved by fabricating the pin to be compliant, allowing the same to move to accommodate the presence of the particle while maintaining sufficient planarity in the substrate.

    摘要翻译： 本发明包括基板支撑系统，其特征在于具有主体表面的卡盘体，所述主体表面具有从其延伸的销，所述销具有位于平面中的接触表面，所述销可移动地联接到所述卡盘主体以相对于所述平面移动。 因此，如果不避免由于颗粒污染物的存在而在衬底中产生非平面性，则衬底支撑系统衰减。 这通过将引脚制造成柔性来实现，使其能够移动以适应颗粒的存在，同时在基板中保持足够的平面性。