- 专利标题: Hydrogen absorption induced metal deposition on palladium and palladium-alloy particles
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申请号: US11019734申请日: 2004-12-22
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公开(公告)号: US20060134505A1公开(公告)日: 2006-06-22
- 发明人: Jia Wang , Radoslav Adzic
- 申请人: Jia Wang , Radoslav Adzic
- 主分类号: H01M4/92
- IPC分类号: H01M4/92 ; H01M4/88 ; B05D5/12
摘要:
The present invention relates to methods for producing metal-coated palladium or palladium-alloy particles. The method includes contacting hydrogen-absorbed palladium or palladium-alloy particles with one or more metal salts to produce a sub-monoatomic or monoatomic metal- or metal-alloy coating on the surface of the hydrogen-absorbed palladium or palladium-alloy particles. The invention also relates to methods for producing catalysts and methods for producing electrical energy using the metal-coated palladium or palladium-alloy particles of the present invention.
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