发明申请
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US11020567申请日: 2004-12-27
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公开(公告)号: US20060138349A1公开(公告)日: 2006-06-29
- 发明人: Arno Bleeker , Johannes Jacobus Baselmans , Marce Mathijs Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Troost
- 申请人: Arno Bleeker , Johannes Jacobus Baselmans , Marce Mathijs Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Troost
- 申请人地址: NL Veldhoven NL Veldhoven
- 专利权人: ASML Netherlands B.V.,ASML Holding N.V.
- 当前专利权人: ASML Netherlands B.V.,ASML Holding N.V.
- 当前专利权人地址: NL Veldhoven NL Veldhoven
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
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