发明申请
US20060138349A1 Lithographic apparatus and device manufacturing method 审中-公开
平版印刷设备和器件制造方法

Lithographic apparatus and device manufacturing method
摘要:
A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
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