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    Interferometric lithography system and method used to generate equal path lengths of interfering beams
    1.
    发明申请
    Interferometric lithography system and method used to generate equal path lengths of interfering beams 有权
    用于产生相等路径长度的干涉光束的干涉光刻系统和方法

    公开(公告)号：US20070153250A1

    公开(公告)日：2007-07-05

    申请号：US11320473

    申请日：2005-12-29

    申请人： Harry Sewell ,  Johannes Jacobus Baselmans

    发明人： Harry Sewell ,  Johannes Jacobus Baselmans

    IPC分类号： G03B27/54

    CPC分类号： G03B27/54 ,  G03F7/70408

    摘要： A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.

    摘要翻译： 提供了将图案写入基板的系统和方法。 引导第一和第二光束在基板上的公共区域中会聚并基本重叠。 这可以进行，使得第一和第二波束在重叠区域中相互时空相干和空间相干以形成干涉条纹以限定写入图像。 调整第一和第二光束的光束宽度。 这可以进行，使得当它们到达公共区域时，波束的相应路径长度匹配，以确保第一和第二波束在公共区域的整个宽度上相互空间相干和时间相干。 在一个示例中，当将图案写入基板时，基板相对于写入图像移动。 在另一个实例中，衬底保持静止。

    Sensor shield
    3.
    发明申请
    Sensor shield 有权
    传感器屏蔽

    公开(公告)号：US20060119816A1

    公开(公告)日：2006-06-08

    申请号：US11005500

    申请日：2004-12-07

    申请人： Johannes Jacobus Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

    发明人： Johannes Jacobus Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

    IPC分类号： G03B27/42 ,  G03C5/00

    CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

    摘要： The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.

    摘要翻译： 光刻设备包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 所述光刻设备还包括被配置为保持基板的基板台，配置成将所述图案化的光束投影到所述基板的目标部分上的投影系统;被配置为测量（a）所述基板台的参数的测量系统，或（b ）基板，或（c）由投影系统投影的图像，或（d）（a） - （c）的任何组合，以及被配置为将液体供应到基板和投影件之间的空间的液体供应系统 系统。 光刻设备还包括设置在测量系统的一部分附近并被配置为将测量系统的部分与液体隔离的屏蔽件。

    Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same
    4.
    发明申请
    Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same 有权
    用于产生掩模图案的平版印刷设备，方法和计算机程序产品以及使用其的设备制造方法

    公开(公告)号：US20060040187A1

    公开(公告)日：2006-02-23

    申请号：US10919532

    申请日：2004-08-17

    申请人： Kars Troost ,  Johannes Jacobus Baselmans ,  Karel Van Der Mast

    发明人： Kars Troost ,  Johannes Jacobus Baselmans ,  Karel Van Der Mast

    IPC分类号： G03C5/00 ,  G06F17/50 ,  G03F1/00

    CPC分类号： G03F7/70283 ,  G03F1/36 ,  G03F7/70291 ,  G03F7/70441

    摘要： Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process of simulating an aerial image that would be produced by the pattern, comparing the simulation to the desired pattern, and adjusting the OPC features may be used to generate an optimum pattern for projection

    摘要翻译： 灰度光学接近校正设备特征通过使用二维校正内核或两个一维校正内核卷积设备特征来添加到掩模图案中，以生成灰度OPC功能。 所得到的图案可以用在具有适于产生三个或更多个强度水平的可编程图案形成装置的投影光刻设备中。 可以使用模拟由图案产生的空间图像，将模拟与期望图案进行比较并调整OPC特征的迭代过程来产生用于投影的最佳图案