- 专利标题: Nitride-based semiconductor device of reduced current leakage
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申请号: US11357567申请日: 2006-02-17
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公开(公告)号: US20060138457A1公开(公告)日: 2006-06-29
- 发明人: Koji Otsuka , Nobuo Kaneko
- 申请人: Koji Otsuka , Nobuo Kaneko
- 申请人地址: JP Niiza-shi
- 专利权人: Sanken Electric Co., Ltd.
- 当前专利权人: Sanken Electric Co., Ltd.
- 当前专利权人地址: JP Niiza-shi
- 优先权: JP2003-313742 20030905
- 主分类号: H01L29/739
- IPC分类号: H01L29/739 ; H01L31/0328 ; H01L29/12 ; H01L29/732
摘要:
A high electron mobility transistor is disclosed which has a double-layered main semiconductor region formed on a silicon substrate via a multilayered buffer region. The multilayered buffer region is in the form of alternations of an aluminum nitride layer and a gallium nitride layer. The main semiconductor region, buffer region, and part of the substrate taper as they extend away from the rest of the substrate, providing slanting side surfaces. An electroconductive antileakage overlay covers these side surfaces via an electrically insulating overlay. Electrically coupled to the silicon substrate via a contact electrode, the antileakage overlay serves for reduction of current leakage along the side surfaces.
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