发明申请
- 专利标题： Coaxial type impedance matching device and impedance detecting method for plasma generation
- 专利标题（中）： 同轴型阻抗匹配装置及等离子体发生阻抗检测方法
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申请号： US11370780申请日： 2006-03-08
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公开(公告)号： US20060144519A1公开(公告)日： 2006-07-06
- 发明人: Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
- 申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 优先权： JPP.2002-158721 20020531; JPP.2002-313818 20021029
- 主分类号： C23F1/00
- IPC分类号： C23F1/00
摘要：
A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
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