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公开(公告)号：US06856211B2
公开(公告)日：2005-02-15
申请号：US10441906
申请日：2003-05-20
申请人： Fumio Yamada , Toshiaki Kitamura , Hiroyuki Kobayashi , Koichi Rokuyama , Akihiro Kubota , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Fumio Yamada , Toshiaki Kitamura , Hiroyuki Kobayashi , Koichi Rokuyama , Akihiro Kubota , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01R13/646 , H03H7/38 , H01Q1/50
CPC分类号： H01R24/542 , H01R24/44 , H01R2103/00
摘要： A coaxial type impedance matching device includes a matching device body including an external conductor and an internal conductor arranged in the external conductor, an input side dielectric disposed in the matching device body and including a first dielectric and a second dielectric, and an output side dielectric disposed in the matching device body and including a third dielectric and a fourth dielectric. Distance between opposed surfaces of the first dielectric and the second dielectric is a predetermined distance, which is in a range of Nλ/4−λ/6 to Nλ/4−λ/6, where λ represents a guide wavelength of an input signal in the matching device body and N represents odd number. Distance between opposed surfaces of the third dielectric and the fourth dielectric is the predetermined distance.
摘要翻译： 同轴型阻抗匹配装置包括匹配装置主体，其包括外部导体和布置在外部导体中的内部导体，输入侧电介质设置在匹配装置主体中并且包括第一电介质和第二电介质，以及输出侧电介质 设置在匹配装置主体中并且包括第三电介质和第四电介质。 第一电介质和第二电介质的相对表面之间的距离为Nλ/ 4-λ/ 6至Nλ/ 4-λ/ 6的范围内的预定距离，其中λ表示输入信号的引导波长 匹配装置主体，N表示奇数。 第三电介质和第四电介质的相对表面之间的距离为预定距离。
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2.发明申请Coaxial type impedance matching device and impedance detecting method for plasma generation 有权同轴型阻抗匹配装置及等离子体发生阻抗检测方法公开(公告)号：US20060144519A1
公开(公告)日：2006-07-06
申请号：US11370780
申请日：2006-03-08
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： C23F1/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。
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3.发明授权Coaxial type impedance matching device and impedance detecting method for plasma generation 有权同轴型阻抗匹配装置及等离子体发生阻抗检测方法公开(公告)号：US07176634B2
公开(公告)日：2007-02-13
申请号：US10951049
申请日：2004-09-27
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。
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4.发明申请Coaxial type impedance matching device and impedance detecting method for plasma generation 有权同轴型阻抗匹配装置及等离子体发生阻抗检测方法公开(公告)号：US20050057164A1
公开(公告)日：2005-03-17
申请号：US10951049
申请日：2004-09-27
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。
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5.发明授权Coaxial type impedance matching device and impedance detecting method for plasma generation 有权同轴型阻抗匹配装置及等离子体发生阻抗检测方法公开(公告)号：US07355379B2
公开(公告)日：2008-04-08
申请号：US11370780
申请日：2006-03-08
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。
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6.发明授权Coaxial type impedance matching device and impedance detecting method for plasma generation 有权同轴型阻抗匹配装置及等离子体发生阻抗检测方法公开(公告)号：US06819052B2
公开(公告)日：2004-11-16
申请号：US10441899
申请日：2003-05-20
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01J724
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： For plasma generation, an impedance matching device and a process of controlling and detecting the impedance matching device are provided to satisfy a preset matching condition. The impedance matching device includes a tubular external conductor and an internal conductor disposed therein, a matching device body including a plurality of dielectrics, a moving mechanism, a storing unit for storing a data table, a measuring device, and a calculation control unit. The impedance detecting process includes inputting a progressive wave and a reflected wave outputted by a directional coupler connected to an object to be matched, generating different signals, and mixing the signals to determine relative phase differences and amplitude ratios of the signals, and detecting an input impedance of the object to be matched on a basis of the detected amplitude ratios and that of a true phase difference between the progressive wave and the reflected wave that is detected by referring to a relationship prepared in advance.
摘要翻译： 对于等离子体产生，提供阻抗匹配装置和控制和检测阻抗匹配装置的过程以满足预设的匹配条件。 阻抗匹配装置包括管状外部导体和布置在其中的内部导体，包括多个电介质的匹配装置主体，移动机构，用于存储数据表的存储单元，测量装置和计算控制单元。 阻抗检测处理包括：输入由连接到要匹配对象的定向耦合器输出的行波和反射波，产生不同的信号，以及混合信号以确定信号的相对相位差和振幅比，以及检测输入 基于检测到的振幅比来匹配的物体的阻抗以及通过参照预先准备的关系检测到的行进波和反射波之间的真相位差的阻抗。
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7.发明授权
公开(公告)号：US5369430A
公开(公告)日：1994-11-29
申请号：US974895
申请日：1992-11-12
申请人： Toshiaki Kitamura
发明人： Toshiaki Kitamura
CPC分类号： H04N5/23212
摘要： A focus detecting method includes the step of projecting the real image of an observation object including a plurality of object patterns onto an image pickup device through an optical system and producing image data from an output of the image pickup device, the step of calculating correlation values of the image data of each of the plurality of object patterns and the image data of a prestored reference pattern while varying the relative positional relation among the image pickup device, the optical system and the observation object in the direction of the optical axis of the optical system, and the step of judging a relative positional relation giving the maximum correlation value as an in-focus state. An apparatus is provided for carrying out the above-described focus detecting method.
摘要翻译： 焦点检测方法包括通过光学系统将包括多个对象图案的观察对象的实际图像投影到图像拾取装置并从图像拾取装置的输出产生图像数据的步骤，计算相关值的步骤 的多个对象图案中的每一个的图像数据和预先存储的参考图案的图像数据，同时在光学器件的光轴方向上改变图像拾取装置，光学系统和观察对象之间的相对位置关系 系统，以及将给出最大相关值的相对位置关系判断为对焦状态的步骤。 提供一种用于执行上述焦点检测方法的装置。
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公开(公告)号：US06519730B1
公开(公告)日：2003-02-11
申请号：US09527484
申请日：2000-03-16
IPC分类号： G06F1100
CPC分类号： G06F11/1407 , G06F11/1641 , G06F11/165 , G06F11/1658
摘要： Disclosed is a computer in which an error caused by an intermittent failure is corrected by using a misprediction recovery mechanism which performs recovery processing if, after having predicted a branch destination of a branch instruction and speculatively executed an instruction at the predicted branch destination, it turns out that the branch prediction was wrong. The computer includes an error detection mechanism for detecting an error in logic operation of the computer, and an instruction re-execution mechanism for correcting an error caused by an intermittent failure when an error is detected by the error detection mechanism, by restoring the computer, using the misprediction recovery mechanism, to a state that existed before the occurrence of the error, and by re-executing a sequence of instructions including the instruction where the error is detected.
摘要翻译： 公开了一种计算机，其中通过使用执行恢复处理的错误预测恢复机制来校正由间歇性故障引起的误差，如果在预测了分支指令的分支目的地并推测在预测分支目的地执行指令之后，则其转向 分支预测是错误的。 计算机包括用于检测计算机的逻辑运算中的错误的错误检测机构，以及用于当通过错误检测机构检测到错误时校正由间歇性故障引起的错误的指令重新执行机构，通过恢复计算机， 使用错误预测恢复机制，到发生错误之前存在的状态，以及通过重新执行包括检测到错误的指令的指令序列。
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公开(公告)号：US5373567A
公开(公告)日：1994-12-13
申请号：US2036
申请日：1993-01-08
CPC分类号： G06K9/685
摘要： In the pattern matching method, when a reference pattern is extracted from the reference picture, check search is carried out repeatedly a plural number of times while conducting picture compressions on the reference picture with the compression start position being changed to obtain correlation values between the reference picture and the reference pattern. Based on the correlation values obtained by the check search, the number of times of search to be done actually and the picture compression ratio for the actual search are determined.
摘要翻译： 在图案匹配方法中，当从参考图像提取参考图案时，在对压缩开始位置进行改变的基准图像上进行图像压缩的同时多次进行检查检索，以获得参考图像之间的相关值 图片和参考图案。 基于通过检查搜索获得的相关值，确定实际搜索的次数和实际搜索的图像压缩比。
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10.发明授权System for controlling operation of processor by adjusting duty cycle of performance control pulse based upon target performance value 失效基于目标性能值调整性能控制脉冲的占空比来控制处理器的运行的系统
公开(公告)号：US5179693A
公开(公告)日：1993-01-12
申请号：US416475
申请日：1989-10-03
IPC分类号： G06F9/38
CPC分类号： G06F9/3869 , G06F9/3836
摘要： A system for adjusting a performance of an information processing apparatus which provides a unit indicating a target performance value, a unit generating a corresponding performance control pulse in accordance with the target performance value, and an execution control unit which alternately sets an execution period and an execution inhibiting period in accordance with the performance control pulse. The unit which generates the performance control pulse sets a ratio of a pulse width and a pulse period of the performance control pulse coincide with the target performance value.
摘要翻译： 一种用于调整提供指示目标性能值的单元的信息处理设备的性能的系统，根据目标性能值产生相应的性能控制脉冲的单元，以及执行控制单元，其交替地设置执行周期和 执行禁止期间根据性能控制脉冲。 产生性能控制脉冲的单元设定性能控制脉冲的脉冲宽度和脉冲周期的比率与目标性能值一致。
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