发明申请
- 专利标题: Charged particle beam apparatus
- 专利标题(中): 带电粒子束装置
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申请号: US11311278申请日: 2005-12-20
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公开(公告)号: US20060151698A1公开(公告)日: 2006-07-13
- 发明人: Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
- 申请人: Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 优先权: JP2004-367153 20041220
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
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