公开(公告)号：US08338781B2

公开(公告)日：2012-12-25

申请号：US13079361

申请日：2011-04-04

Applicant: Yuko Sasaki ,  Makoto Ezumi ,  Makoto Nishihara ,  Tsutomu Kawai ,  Toshiaki Yanokura

Inventor： Yuko Sasaki ,  Makoto Ezumi ,  Makoto Nishihara ,  Tsutomu Kawai ,  Toshiaki Yanokura

IPC: H01J37/304

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/15 ,  H01J2237/2826 ,  H01J2237/3045

Abstract: In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.

Abstract translation: 在扫描带电粒子束的方法中，其可以将扫描位置定位在带电粒子束的扫描位置的可偏转范围内的适当位置，带电粒子束的扫描位置偏转到扫描内的多个目标物体 位置可偏转区域，并且基于偏转之后的扫描位置处的目标物体的偏移，校正扫描位置处的偏转量。

公开(公告)号：US08324594B2

公开(公告)日：2012-12-04

申请号：US12370242

申请日：2009-02-12

Applicant: Hiroyuki Ito ,  Yuko Sasaki ,  Tadashi Otaka

Inventor： Hiroyuki Ito ,  Yuko Sasaki ,  Tadashi Otaka

IPC: G01F23/00 ,  G21K5/08 ,  G21K5/10

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/30 ,  H01J2237/0216 ,  H01J2237/20214 ,  H01J2237/20221

Abstract: A charged particle beam apparatus can be constructed with a smaller size (resulting in a small installation space) and a lower cost, suppress vibration, operate at higher speed, and be reliable in inspection. The charged particle beam apparatus is largely effective when a wafer having a large diameter is used. The charged particle beam apparatus includes: a plurality of inspection mechanisms, each of which is mounted on a vacuum chamber and has a charged particle beam mechanism for performing at least an inspection on the sample; a single-shaft transfer mechanism that moves the sample between the inspection mechanisms in the direction of an axis of the single-shaft transfer mechanism; and a rotary stage that mounts the sample thereon and has a rotational axis on the single-shaft transfer mechanism. The single-shaft transfer mechanism moves the sample between the inspection mechanisms in order that the sample is placed under any of the inspection mechanisms. The rotary stage positions the sample such that a target portion of the sample can be inspected by the inspection mechanism under which the sample is placed, and the inspection mechanisms inspect the sample.

Abstract translation: 带电粒子束装置可以以较小的尺寸（导致小的安装空间）和较低的成本，抑制振动，更高的速度运行并且可靠地进行检查。 当使用具有大直径的晶片时，带电粒子束装置很有效。 带电粒子束装置包括：多个检查机构，每个检查机构安装在真空室上，并具有至少对样品进行检查的带电粒子束机构; 单轴传送机构，其在所述检查机构之间沿所述单轴传送机构的轴线的方向移动所述样本; 以及将样品安装在其上并在单轴传送机构上具有旋转轴的旋转台。 单轴传送机构将样品移动到检查机构之间，以便将样品放置在任何检查机构下。 旋转台定位样品，使得样品的目标部分可以通过放置样品的检查机构进行检查，检查机构检查样品。

公开(公告)号：US08207513B2

公开(公告)日：2012-06-26

申请号：US12615955

申请日：2009-11-10

Applicant: Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

Inventor： Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

IPC: G21K5/10

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/141 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/2817

Abstract: A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

Abstract translation: 提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。 该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性 在高分辨率和广域的观察视野之间。

公开(公告)号：US20120135067A1

公开(公告)日：2012-05-31

申请号：US13376009

申请日：2010-06-04

Applicant: Kazuhiro Matsuda ,  Koji Ichiyama ,  Sachie Matsuda ,  Yuko Sasaki ,  Yoshichika Arakawa ,  Ryo Harasawa ,  Yoshihiro Nishida ,  Norio Katayama ,  Yasuo Endo ,  Nobuo Nomura

Inventor： Kazuhiro Matsuda ,  Koji Ichiyama ,  Sachie Matsuda ,  Yuko Sasaki ,  Yoshichika Arakawa ,  Ryo Harasawa ,  Yoshihiro Nishida ,  Norio Katayama ,  Yasuo Endo ,  Nobuo Nomura

IPC: A61K9/127 ,  A61P37/04 ,  A61K39/02 ,  A61K39/09 ,  A61P31/16 ,  A61P31/00 ,  A61P11/06 ,  A61P19/02 ,  A61P11/00 ,  A61K9/00 ,  A61K39/145

CPC classification number: A61K39/0241 ,  A61K9/127 ,  A61K9/1272 ,  A61K39/12 ,  A61K39/145 ,  A61K39/39 ,  A61K2039/55555 ,  A61K2039/55594 ,  Y02A50/403

Abstract: Disclosed is a vaccine which has a high therapeutic effect on mycoplasma infection and is highly safe. For the purpose of developing effective therapeutic methods for mycoplasma infection, mycoplasma-mimic particles which are effective as a vaccine for mycoplasma infection are provided, and also provided are bacterium-mimic particles including common bacteria. Bacterium-mimic particles such as mycoplasma-mimic particles can be provided by producing liposome particles in which a lipid antigen specific to a pathogenic bacterium such as mycoplasma is contained as a liposome-constituting lipid component. The administration of the mycoplasma-mimic particles enables the induction of a potent immunological activity in living bodies. The mycoplasma-mimic particles can be used as an excellent vaccine for the prevention or treatment of mycoplasma infection.

Abstract translation: 公开了对支原体感染具有高治疗效果的疫苗，并且是高度安全的。 为了开发有效的支原体感染治疗方法，提供了作为支原体感染疫苗有效的支原体模拟颗粒，并且还提供了包括常见细菌的细菌模拟颗粒。 可以通过生产脂质体颗粒来提供细菌模拟颗粒，例如支原体模拟颗粒，其中作为构成脂质体的脂质组分含有诸如支原体的致病菌特异性的脂质抗原。 支原体模拟颗粒的施用使得能够诱导活体中有效的免疫活性。 支原体模拟颗粒可用作预防或治疗支原体感染的优良疫苗。

公开(公告)号：US07728294B2

公开(公告)日：2010-06-01

申请号：US11808247

申请日：2007-06-07

Applicant: Takashi Hiroi ,  Kenji Tanimoto ,  Yuko Sasaki ,  Hiroshi Makino

Inventor： Takashi Hiroi ,  Kenji Tanimoto ,  Yuko Sasaki ,  Hiroshi Makino

IPC: H01J37/21 ,  H01J37/26

CPC classification number: H01J37/20 ,  G01R31/307 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2008 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/221 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/28

Abstract: A semiconductor wafer inspection tool and a semiconductor wafer inspection method capable of conducting an inspection under appropriate conditions in any one of an NVC (Negative Voltage Contrast) mode and a PVC (Positive Voltage Contrast) mode is provided. Primary electrons 2 are irradiated onto a wafer to be inspected 6 and the irradiation position thereof is scanned in an XY direction. Secondary electrons (or reflected electrons) 10 from the wafer to be inspected 6 are controlled by a charge control electrode 5 and detected by a sensor 11. An image processor converts a detection signal from the sensor 11 to a detected image, compares the detected image with a predetermined reference image, judges defects, an overall control section 14 selects inspection conditions from recipe information for each wafer to be inspected 6 and sets a voltage to be applied to the charge control electrode 5. A Z stage 8 sets the distance between the wafer to be inspected 6 and the charge control electrode 5 according to this voltage.

Abstract translation: 提供能够在适当条件下进行NVC（负电压对比度）模式和PVC（正电压对比度）模式中的任一种的半导体晶片检查工具和半导体晶片检查方法。 将一次电子2照射到要检查的晶片6上，并且其XY照射位置被扫描。 来自待检查晶片的二次电子（或反射电子）10由充电控制电极5控制并由传感器11检测。图像处理器将来自传感器11的检测信号转换为检测图像， 通过预定的参考图像判断缺陷，总体控制部分14从每个要检查的晶片的配方信息中选择检查条件6并设置要施加到充电控制电极5的电压.Za级8设置晶片之间的距离 根据该电压检查6和充电控制电极5。

公开(公告)号：US07425702B2

公开(公告)日：2008-09-16

申请号：US10838342

申请日：2004-05-05

Applicant: Yuko Sasaki ,  Mitsugu Sato

Inventor： Yuko Sasaki ,  Mitsugu Sato

IPC: H01J37/244

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J2237/043 ,  H01J2237/049 ,  H01J2237/28

Abstract: When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.

公开(公告)号：US20060243908A1

公开(公告)日：2006-11-02

申请号：US11452989

申请日：2006-06-15

Applicant: Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

Inventor： Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

IPC: G21K7/00

CPC classification number: G01N23/225 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

Abstract: An apparatus for inspecting a sample using a scanning electron microscope includes a sample stage, a first electron-optical system to scan an electron beam of a first beam current on the sample, a second electron-optical system to scan an electron beam of a second beam current smaller than the first beam current on the sample, a mechanism to move the sample stage, a detector provided in each of the first and second electron-optical systems to detect a secondary electron. The first electron-optical system is operable in a first mode and the second electron-optical system is operable in a second mode with higher resolution than that of the first mode. In the first mode, the sample is observed while the sample stage is moved continuously, and in the second mode, the sample is observed by detecting a secondary electron using the detector while the sample stage is held stationary.

Abstract translation: 使用扫描电子显微镜检查样品的装置包括样品台，用于扫描样品上的第一束电流的电子束的第一电子 - 光学系统，用于扫描第二电子束的电子束的第二电子 - 光学系统 光束电流小于样品上的第一光束电流，移动样品台的机构，设置在每个第一和第二电子光学系统中的检测二次电子的检测器。 第一电子 - 光学系统可在第一模式中操作，并且第二电子 - 光学系统可以以比第一模式更高的分辨率在第二模式中操作。 在第一模式中，在样品台连续移动时观察样品，在第二模式中，通过在样品台保持静止时使用检测器检测二次电子来观察样品。

公开(公告)号：US07875858B2

公开(公告)日：2011-01-25

申请号：US12349708

申请日：2009-01-07

Applicant: Hiroyuki Ito ,  Yuko Sasaki ,  Ryoichi Ishii ,  Takashi Doi

Inventor： Hiroyuki Ito ,  Yuko Sasaki ,  Ryoichi Ishii ,  Takashi Doi

IPC: H01J1/50 ,  G21K1/08 ,  G21K1/093

CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/1534

Abstract: The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction systems. To this end, the present invention uses a configuration which forms electromagnetic field which is concentrated towards a center of a beam trajectory axis, causes oblique of the beam to make use of lens effects and bend the trajectory, and consequently, cancels out large external side non-linear effects such a spherical aberration of the electron lens. Specifically, the configuration generates an electric field concentration in a simple manner by providing electrodes above the axis and applying voltages to the electrodes. Further, the above configuration can be realized trough operations using lenses and deflectors with incident axes and image formation positions that are normal.

Abstract translation: 本发明涉及一种用于带电粒子束的轨迹校正方法，并且提供了一种用于带电粒子束的低成本，高精度和高分辨率会聚光学系统，以解决常规像差校正系统的问题。 为此，本发明使用形成朝向光束轨迹轴的中心集中的电磁场的结构，使得光束的倾斜利用透镜效果并弯曲轨迹，因此抵消了大的外侧 电子透镜的非线性效应如球面像差。 具体地说，该配置通过在轴上方设置电极并向电极施加电压，以简单的方式产生电场浓度。 此外，可以通过使用具有入射轴和成像位置的透镜和偏转器的槽操作来实现上述配置。

公开(公告)号：US20090139536A1

公开(公告)日：2009-06-04

申请号：US11665687

申请日：2005-10-25

Applicant: Hiroko Yano ,  Hirofumi Kera ,  Wakae Matsuyama ,  Kumiko Kuroki ,  Miki Ishida ,  Yuko Sasaki ,  Miyako Okamoto ,  Yasuo Goto ,  Yoshiko Masushio ,  Etsu Nishijima

Inventor： Hiroko Yano ,  Hirofumi Kera ,  Wakae Matsuyama ,  Kumiko Kuroki ,  Miki Ishida ,  Yuko Sasaki ,  Miyako Okamoto ,  Yasuo Goto ,  Yoshiko Masushio ,  Etsu Nishijima

IPC: A45D40/30 ,  A45D40/26

CPC classification number: A45D44/005 ,  A45D40/30

Abstract: A lip categorizing method uses the size and shape of the lips as viewed from the front of the face as a first categorization index and the three-dimensional form of the lips as a second categorization index. The lip categorizing map is composed of a first coordinate axis showing the degree of the first categorization index and a second coordinate axis showing the degree of the second categorization index and has a coordinate system in which the first and second coordinate axes are orthogonal. It also generates makeup information for two-dimensionally correcting the lips of a subject based on preset reference by setting a plurality of points for determining the form features of lips on an image that depicts the lips, and judges the form features of the lips of the subject based on analytical values of the two-dimensional features of the lips measured from the set points.

Abstract translation: 嘴唇分类方法使用从脸部前面观察的嘴唇的大小和形状作为第一分类指数，并将嘴唇的三维形式作为第二分类指数。 唇分类图由表示第一分类指数的程度的第一坐标轴和表示第二分类指标的程度的第二坐标轴组成，并具有其中第一和第二坐标轴正交的坐标系。 它还通过设置用于确定描绘嘴唇的图像上的嘴唇的形状特征的多个点来基于预设参考来生成用于二维地校正被摄体的嘴唇的化妆信息，并且判断唇部的形状特征 基于从设定点测量的唇的二维特征的分析值的主题。

公开(公告)号：US07435960B2

公开(公告)日：2008-10-14

申请号：US11808376

申请日：2007-06-08

Applicant: Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

Inventor： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

IPC: H01J37/28 ,  H01J37/256

CPC classification number: H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

Abstract: A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.

Abstract translation: 带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。 该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及 施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储 轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。