CHARGED PARTICLE BEAM APPARATUS
    1.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号:US20100051806A1

    公开(公告)日:2010-03-04

    申请号:US12615955

    申请日:2009-11-10

    IPC分类号: G01N23/225

    摘要: A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

    摘要翻译: 提供具有高分辨率和宽扫描区域(观察视场)的带电粒子束装置。 该装置具有用于调节焦点的单元,用于调节散光的单元,用于控制和检测扫描位置的单元,以及控制器,用于与扫描位置互锁地控制焦点调节和像散调整,由此确保相容性 在高分辨率和广域的观察视野之间。

    Charged particle beam apparatus
    2.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US08207513B2

    公开(公告)日:2012-06-26

    申请号:US12615955

    申请日:2009-11-10

    IPC分类号: G21K5/10

    摘要: A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

    摘要翻译: 提供具有高分辨率和宽扫描区域(观察视场)的带电粒子束装置。 该装置具有用于调节焦点的单元,用于调节散光的单元,用于控制和检测扫描位置的单元,以及控制器,用于与扫描位置互锁地控制焦点调节和像散调整,由此确保相容性 在高分辨率和广域的观察视野之间。

    Charged particle beam apparatus
    3.
    发明申请
    Charged particle beam apparatus 审中-公开
    带电粒子束装置

    公开(公告)号:US20060151698A1

    公开(公告)日:2006-07-13

    申请号:US11311278

    申请日:2005-12-20

    IPC分类号: G21K7/00

    摘要: A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

    摘要翻译: 提供具有高分辨率和宽扫描区域(观察视场)的带电粒子束装置。 该装置具有用于调节焦点的单元,用于调节散光的单元,用于控制和检测扫描位置的单元,以及控制器,用于与扫描位置互锁地控制焦点调节和像散调整,由此确保相容性 在高分辨率和广域的观察视野之间。

    CIRCUIT PATTERN INSPECTING APPARATUS, MANAGEMENT SYSTEM INCLUDING CIRCUIT PATTERN INSPECTING APPARATUS, AND METHOD FOR INSPECTING CIRCUIT PATTERN
    4.
    发明申请
    CIRCUIT PATTERN INSPECTING APPARATUS, MANAGEMENT SYSTEM INCLUDING CIRCUIT PATTERN INSPECTING APPARATUS, AND METHOD FOR INSPECTING CIRCUIT PATTERN 有权
    电路图形检查装置,包括电路图形检查装置的管理系统,以及检查电路图案的方法

    公开(公告)号:US20110255773A1

    公开(公告)日:2011-10-20

    申请号:US13125718

    申请日:2009-10-19

    IPC分类号: G06K9/00

    摘要: The operation rate of a circuit pattern inspecting apparatus is prevented from deteriorating by measuring image noise of the circuit pattern inspecting apparatus and detecting the sign that the apparatus is to be in an abnormal state. Provided is the circuit pattern inspecting apparatus wherein circuit pattern abnormalities are detected by irradiating a substrate having a circuit pattern formed thereon with an electron beam and detecting generated secondary electrons or reflected electrons. The circuit pattern inspecting apparatus is provided with: an image processing section wherein an image is generated based on the signal intensities of the detected secondary electrons or those of the reflected electrons and the image is displayed for a display apparatus of the interface; and a control section which analyzes the frequency of noise included in the image.

    摘要翻译: 通过测量电路图形检查装置的图像噪声并检测装置处于异常状态的符号,防止电路图形检查装置的操作速度恶化。 提供电路图案检查装置,其中通过用形成有电子束的电路图案照射基板并检测产生的二次电子或反射电子来检测电路图案异常。 电路图案检查装置具有:图像处理部,其基于检测出的二次电子的信号强度或反射电子的信号强度生成图像,并且显示用于界面的显示装置的图像; 以及分析图像中包含的噪声频率的控制部分。

    SEMICONDUCTOR DEVICE INSPECTION APPARATUS
    5.
    发明申请
    SEMICONDUCTOR DEVICE INSPECTION APPARATUS 失效
    半导体器件检测装置

    公开(公告)号:US20100314542A1

    公开(公告)日:2010-12-16

    申请号:US12860363

    申请日:2010-08-20

    IPC分类号: H01J37/244 H01J37/26

    CPC分类号: G01R31/307

    摘要: A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

    摘要翻译: 具有噪声减除​​功能的半导体器件检查装置包括电子枪,用于保持样品的级,用于检测从样品放出的信号的主检测器,以及用于检测从样品产生的噪声的至少一个或多个副检测器, 装置,从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声,以消除或降低信号中的噪声。

    CHARGED PARTICLE BEAM APPARATUS, AND IMAGE GENERATION METHOD WITH CHARGED PARTICLE BEAM APPARATUS
    6.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS, AND IMAGE GENERATION METHOD WITH CHARGED PARTICLE BEAM APPARATUS 失效
    充电颗粒光束装置和带有粒子束装置的图像生成方法

    公开(公告)号:US20090134340A1

    公开(公告)日:2009-05-28

    申请号:US12273805

    申请日:2008-11-19

    IPC分类号: H01J3/14

    摘要: The present invention has a subject to provide an apparatus that optimizes scanning in accordance with circumstances or purposes, reduces distortion of images, and improves throughput, image quality, and defect detection rate by controlling deflection of a charged particle beam in a stage tracking system. To solve this subject, an apparatus according to the present invention is an inspection apparatus for detecting abnormal conditions of an inspection target by irradiating the inspection target with the charged particle beam and detecting generated secondary electrons, including both a stage that moves continuously with the inspection target placed thereon and a deflection control circuit for providing a deflector with a scanning signal that causes the charged particle beam to scan repeatedly in a direction substantially perpendicular to a stage movement axis direction while the charged particle beam being deflected in the stage movement axis direction in accordance with a change in movement speed of the stage during movement of the stage.

    摘要翻译: 本发明提供一种根据情况或目的优化扫描的装置,减少图像的失真,并且通过控制在舞台跟踪系统中的带电粒子束的偏转来提高吞吐量,图像质量和缺陷检测率。 为了解决这个问题,根据本发明的装置是一种检查装置,用于通过用带电粒子束照射检查对象并检测产生的二次电子来检测检查对象的异常状况,包括两个检查阶段连续移动的阶段 目标物放置在其上,以及偏转控制电路,用于向偏转器提供扫描信号,该扫描信号使得带电粒子束在基本上垂直于载物台移动轴线方向的方向上反复扫描,同时带电粒子束在载物台移动轴线方向上偏转 根据舞台运动中舞台的移动速度的变化。

    Heat-Resistant Water-Soluble Flux Composition for Soldering
    7.
    发明申请
    Heat-Resistant Water-Soluble Flux Composition for Soldering 有权
    用于焊接的耐热水溶性助焊剂组合物

    公开(公告)号:US20080066830A1

    公开(公告)日:2008-03-20

    申请号:US11632455

    申请日:2005-07-15

    IPC分类号: B23K35/363

    CPC分类号: B23K35/3612

    摘要: There is provided a water-soluble flux composition for soldering which is excellent particularly in heat resistance and flux residues after soldering of which can be easily removed by washing with water or warm water. The flux composition for soldering contains a compound of formula (1): wherein R1, R2, R3, Rd4, R5 and R6 independently of one another are a hydrocarbon group or hydrogen atom, and A1, A2 and A3 independently of one another are hydroxy group or an organic group of formula (2): and at least one of A1, A2 and A3 is an organic group of formula (2).

    摘要翻译: 提供了一种用于焊接的水溶性助焊剂组合物,其特别是耐热性优异,焊接后的焊剂残留物可以通过用水或温水洗涤而容易地除去。 用于焊接的焊剂组合物包含式(1)的化合物:其中R 1,R 2,R 3,R 4, R 5,R 5和R 6彼此独立地为烃基或氢原子,A 1,O 2, > 2和A 3彼此独立地是羟基或式(2)的有机基团:并且A 1,A 2, SUP> 2和A 3是式(2)的有机基团。

    SEMICONDUCTOR DEVICE INSPECTION APPARATUS
    10.
    发明申请
    SEMICONDUCTOR DEVICE INSPECTION APPARATUS 失效
    半导体器件检测装置

    公开(公告)号:US20080308725A1

    公开(公告)日:2008-12-18

    申请号:US12132361

    申请日:2008-06-03

    IPC分类号: G01N23/00

    CPC分类号: G01R31/307

    摘要: A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

    摘要翻译: 具有噪声减除​​功能的半导体器件检查装置包括电子枪,用于保持样品的级,用于检测从样品放出的信号的主检测器,以及用于检测从样品产生的噪声的至少一个或多个副检测器, 装置,从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声,以消除或降低信号中的噪声。